The Frequency Dependent of Main Electrical Parameters, Conductivity and Surface States in the Al/ (%0.5 Bi:ZnO)/p-Si/Au (MIS) Structures

被引:6
|
作者
Cetinkaya, H. G. [1 ]
Bengi, S. [2 ]
Durmus, P. [3 ]
Demirezen, S. [4 ]
Altindal, S. [3 ]
机构
[1] Gazi Univ, Vocat Sch Hlth Serv, Ankara, Turkiye
[2] Baskent Univ, Vocat Sch Tech Sci, Ankara, Turkiye
[3] Gazi Univ, Fac Sci, Dept Phys, Ankara, Turkiye
[4] Amasya Univ, Sabuncuoglu Serefeddin Vocat Sch Hlth Serv, Amasya, Turkiye
关键词
(%0.5 Bi:ZnO) interlayer; Frequency and voltage dependence; High-low frequency capacitance and Hill-Coleman method; Surface states and series resistance; SI MS STRUCTURES; SERIES RESISTANCE; INTERFACE STATES; SEMICONDUCTOR; DENSITY; DIODES; LAYER; FILMS;
D O I
10.1007/s12633-024-02929-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The capacitance/conductance-voltage-frequency (C/G-V-f) features of the Au/p-Si structures with (%0.5 Bi-doped ZnO) interlayer grown by spin-coating technique was investigated between 100 kHz and 1 MHz. The C-2-V curves that depend on frequency were used to determine the electrical-parameters like diffusion-potential (V-D), Fermi-energy level (E-F), barrier-height (Phi(B)), and depletion-layer (W-D) thickness. The value of Phi(B) was found to increase with increasing frequency due to the decrease in surface-states (N-ss) effects on the C-V characteristics. Voltage dependent series-resistance (R-s) was obtained by using Nicollian-Brews method for each frequency and it decreased with increasing frequency. Both the low-high frequency capacitance (C-LF-C-HF) and Hill-Coleman techniques were used to determine the voltage-dependent profile of N-ss. While N-ss decreases with increasing frequency, voltage-dependent on them give two distinctive peaks due to a special distribution of them at interlayer/semiconductor interface in the bandgap depending on their relaxation time. All these experimental results indicate that the existence of R-s, N-ss, and interlayers considerably influence the impedance measurements.
引用
收藏
页码:2315 / 2322
页数:8
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