Fabrication of CrFeCoNiSi High Entropy Alloys Dispersed with Silicon Compounds by Low-Pressure Plasma Spraying

被引:0
|
作者
Hoshiyama, Yasuhiro [1 ]
Hamamoto, Daichi [2 ]
Maruoka, Tomoki [3 ]
机构
[1] Kansai Univ, Fac Chem Mat & Bioengn, Dept Chem & Mat Engn, Suita 5648680, Japan
[2] Kansai Univ, Grad Sch Sci & Engn, Suita 5648680, Japan
[3] Kyoto Municipal Inst Ind Technol & Culture, Kyoto 6008815, Japan
关键词
high entropy alloy; plasma spraying; silicon compound; precipitate; rapid solidi fi cation; MECHANICAL-PROPERTIES; PRECIPITATION; MICROSTRUCTURE;
D O I
10.2320/matertrans.MT-T2023004
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We aimed to fabricate CrFeCoNiSi HEA deposits dispersed with Si compounds by low-pressure plasma spraying, and we evaluated the structure and properties of the alloy deposits. A heat treatment was applied to the fabricated alloy deposits, and the formation process of precipitates in HEAs was investigated. We fabricated HEA deposits without segregation on substrates with and without water-cooling. The fcc solid solution existed in the as-sprayed deposits and heat-treated deposits. Si compounds were dispersed in the deposits. The precipitates became coarser as the heat-treatment temperature increased. The 873 K heat-treated deposits had the highest hardness both with and without water-cooling. Nanoscale precipitates were formed inside the crystal grains in the as-sprayed deposits with water-cooling. The 1273 K heat-treated deposits satisfied the definition of HEAs.
引用
收藏
页码:2826 / 2830
页数:5
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