2D ZnO;
van der Waals heterostructure;
graphene;
spin-polarized density functional theory;
band structure;
defect engineering;
hydrogen adsorption;
ZNO MONOLAYER;
GRAPHENE;
OXIDE;
STABILITY;
BANDGAP;
FIELD;
D O I:
10.3390/app13127243
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
This paper presents a theoretical study on the effects of selected defects (oxygen vacancies and substitutional Fe-Zn atoms) on the structural and electronic properties of a 2D ZnO/graphene heterostructure. Spin-polarized Hubbard- and dispersion-corrected density functional theory (DFT) was used to optimize the geometrical configurations of the heterostructure and to analyze the equilibrium distance, interlayer distance, adhesion energy, and bond lengths. Charge density difference (CDD) analysis and band structure calculations were also performed to study the electronic properties of the heterostructure. The results show that the presence of defects affects the interlayer distance and adhesion energy, with structures including oxygen vacancies and Fe-Zn substitutional atoms having the strongest interaction with graphene. It is demonstrated that the oxygen vacancies generate localized defect states in the ZnO bandgap and lead to a shift of both valence and conduction band positions, affecting the Schottky barrier. In contrast, Fe dopants induce strong spin polarization and high spin density localized on Fe atoms and their adjacent oxygen neighbors as well as the spin asymmetry of Schottky barriers in 2D ZnO/graphene. This study presents a comprehensive investigation into the effects of graphene on the electronic and adsorption properties of 2D ZnO/graphene heterostructures. The changes in electronic properties induced by oxygen vacancies and Fe dopants can enhance the sensitivity and catalytic activity of the 2D ZnO/graphene system, making it a promising material for sensing and catalytic applications.
机构:
Hongik Univ, Dept Mat Sci & Engn, 72-1 Sangsu Dong, Seoul 04066, South KoreaChonnam Natl Univ, Grad Sch, Dept Polymer Engn, Gwangju 61186, South Korea
机构:
Indian Inst Technol, Dept Phys, Kharagpur 721302, W Bengal, IndiaIndian Inst Technol, Dept Phys, Kharagpur 721302, W Bengal, India
Khan, Anasua
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Chatterjee, Swastika
Nath, T. K.
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机构:
Indian Inst Technol, Dept Phys, Kharagpur 721302, W Bengal, IndiaIndian Inst Technol, Dept Phys, Kharagpur 721302, W Bengal, India
Nath, T. K.
Taraphder, A.
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机构:
Indian Inst Technol, Dept Phys, Kharagpur 721302, W Bengal, India
Indian Inst Technol, Ctr Theoret Studies, Kharagpur 721302, W Bengal, IndiaIndian Inst Technol, Dept Phys, Kharagpur 721302, W Bengal, India
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Cho, Byungjin
Yoon, Jongwon
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Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Gwangju 500712, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Yoon, Jongwon
Lim, Sung Kwan
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Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Gwangju 500712, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Lim, Sung Kwan
Kim, Ah Ra
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Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Kim, Ah Ra
Kim, Dong-Ho
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Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Kim, Dong-Ho
Park, Sung-Gyu
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Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Park, Sung-Gyu
Kwon, Jung-Dae
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Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Kwon, Jung-Dae
Lee, Young-Joo
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Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Lee, Young-Joo
Lee, Kyu-Hwan
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Korea Inst Mat Sci, Electrochem Dept, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Lee, Kyu-Hwan
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Lee, Byoung Hun
Ko, Heung Cho
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Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Gwangju 500712, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Ko, Heung Cho
Hahm, Myung Gwan
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Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea