Heterogeneous reservoir computing in second-order Ta2O5/HfO2 memristors

被引:9
|
作者
Ghenzi, Nestor [1 ,2 ,3 ,4 ]
Park, Tae Won [1 ,2 ]
Kim, Seung Soo [1 ,2 ]
Kim, Hae Jin [5 ]
Jang, Yoon Ho [1 ,2 ]
Woo, Kyung Seok [1 ,2 ]
Hwang, Cheol Seong [1 ,2 ]
机构
[1] Seoul Natl Univ Gwanak, Dept Mat Sci & Engn, Gwanak Ro 1, Seoul 08826, South Korea
[2] Seoul Natl Univ Gwanak, Inter Univ Semicond Res Ctr, Gwanak Ro 1, Seoul 08826, South Korea
[3] Univ Avellaneda UNDAV, Avellaneda, Argentina
[4] Consejo Nacl Invest Cient & Tecn CONICET, Buenos Aires, Argentina
[5] Myongji Univ, Dept Mat Sci & Engn, Yongin 17058, South Korea
基金
新加坡国家研究基金会;
关键词
D O I
10.1039/d3nh00493g
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Multiple switching modes in a Ta2O5/HfO2 memristor are studied experimentally and numerically through a reservoir computing (RC) simulation to reveal the importance of nonlinearity and heterogeneity in the RC framework. Unlike most studies, where homogeneous reservoirs are used, heterogeneity is introduced by combining different behaviors of the memristor units. The chosen memristor for the reservoir units is based on a Ta2O5/HfO2 bilayer, in which the conductances of the Ta2O5 and HfO2 layers are controlled by the oxygen vacancies and deep/shallow traps, respectively, providing both volatile and non-volatile resistive switching modes. These several control parameters make the second-order Ta2O5/HfO2 memristor system present different behaviors in agreement with its history-dependent conductance and allow the fine-tuning of the behavior of each reservoir unit. The heterogeneity in the reservoir units improves the pattern recognition performance in the heterogeneous memristor RC system with a similar physical structure.
引用
收藏
页码:427 / 437
页数:12
相关论文
共 50 条
  • [31] EVAPORATION OF TA2O5
    KAZENAS, EK
    PETROV, AA
    SAMOILOVA, IO
    RUSSIAN METALLURGY, 1994, (05): : 16 - 19
  • [32] EFFECT OF HIGH-TEMPERATURE CUBIC ROLLING COMPRESSION ON TIO2, ZRO2, HFO2, NB2O5, TA2O5 OXIDES
    FEDYUKOV, AS
    ALYAMOVSKII, SI
    MIROSHNIKOVA, LD
    ZAINULIN, YG
    ZHURNAL NEORGANICHESKOI KHIMII, 1987, 32 (09): : 2083 - 2086
  • [33] The comparison between Ta2O5 and Ti-doped Ta2O5 dielectrics
    Kao, Chyuan Haur
    Lai, Pei Lun
    Wang, Hsin Yuan
    SURFACE & COATINGS TECHNOLOGY, 2013, 231 : 512 - 516
  • [34] Defect energy levels in Ta2O5 and nitrogen-doped Ta2O5
    Shin, Hyunho
    Park, Sang Yeup
    Bae, Shin-Tae
    Lee, Sangwook
    Hong, Kug Sun
    Jung, Hyun Suk
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (11)
  • [35] Improved speed and data retention characteristics in flash memory using a stacked HfO2/Ta2O5 charge-trapping layer
    Zheng, Zhiwei
    Huo, Zongliang
    Zhang, Manhong
    Zhu, Chenxin
    Liu, Jing
    Liu, Ming
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2011, 26 (10)
  • [36] In-sensor computing using a Cu-doped Ta2O5 reservoir for optical pattern classification
    Hayakawa, Masaru
    Tanaka, Hirofumi
    Hasegawa, Tsuyoshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2025, 64 (03)
  • [37] Effect of sodium addition and thermal annealing on second-order optical nonlinearity in thermally poled amorphous Ta2O5 thin films
    Tong, Amy S. K.
    Bondu, Flavie
    Murugan, G. Senthil
    Wilkinson, James S.
    Dussauze, Marc
    JOURNAL OF APPLIED PHYSICS, 2019, 125 (01)
  • [38] ALD Ta2O5 and Hf-doped Ta2O5 for BEOL compatible MIM
    Triyoso, D. H.
    Weinreich, W.
    Seidel, K.
    Nolan, M. G.
    Polakowski, P.
    Utess, D.
    Ohsiek, S.
    Dittmar, K.
    Weisheit, M.
    Liebau, M.
    Fox, R.
    2014 IEEE INTERNATIONAL CONFERENCE ON IC DESIGN & TECHNOLOGY (ICICDT), 2014,
  • [39] AUGER-ELECTRON SPECTROSCOPY APPLIED TO THE STUDY OF TA/TA2O5, TA2O5/MNO2 INTERFACES
    FOULET, G
    ZHANG, M
    WEHLING, F
    GROOS, M
    HOULE, JL
    AKKAD, N
    ANALUSIS, 1995, 23 (05) : 215 - 221
  • [40] Electrical characteristics of Pt/SrBi2Ta2O9/Ta2O5/Si using Ta2O5 as the buffer layer
    Choi, HS
    Kim, YT
    Kim, SI
    Choi, IH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (4B): : 2940 - 2942