Full-wave and plasma simulations of microstrip excited, high-frequency, atmospheric pressure argon microdischarges

被引:0
|
作者
Kourtzanidis, Konstantinos [1 ]
机构
[1] Ctr Res & Technol Hellas CERTH, Chem Proc & Energy Resources Inst CPERI, Thessaloniki, Greece
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2023年 / 32卷 / 02期
关键词
microdischarge; plasma modelling; plasma wave interactions; argon plasma; microwave plasma; microwave plasma simulations; atmospheric pressure plasma; BOLTZMANN-EQUATION; MICROWAVE; MICROPLASMA; EMISSION; GUIDE; AIR;
D O I
10.1088/1361-6595/acb811
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Two-dimensional fully coupled electromagnetic (EM) wave-plasma simulations are used to study the formation, early transient and quasi-steady state of the argon plasma excited by a two-dimensional discontinuous microstrip line. The EM waves that normally propagate in the microstrip transmission line, radiate and scatter at the position of the gap and the electric field is enhanced primarily at the corner of the gap. The microdischarge is preferentially formed at this position of the EM field hotspot and in low frequencies propagates on the dielectric surface, much like a microwave surface streamer. In longer times, diffusion dominates and the whole gap is filled with plasma of maximum density in the order of 1020 m-3 while it occupies a volume larger than the gap. Cycle-averaged mean electron temperatures range from 2.8 to 3.9 eV, while the plasma reaches a quasi-static regime in approximately 2 mu s having reconfigured the transmission and radiation patterns of the slitted microstrip line. The tunability of the microstrip due to plasma formation provides means for sustaining the discharge in a stable regime. For the same input EM power, the electron temperature increases with increasing excitation frequency while electron densities found to decrease. For the same wave frequency, a decrease of the electron densities with increasing gap is also found in addition to a restriction of the discharge expansion. Finally, thicker dielectrics result to higher electron densities and electron temperatures as well as absorbed power from the plasma. These findings are attributed to the dependence of absorbed EM power and skin depth on the EM wave angular frequency, the critical for shielding electron density as well as the restructuring of the S-parameters due to the changes in operational parameters.
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页数:18
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