Synthesis of thiophene Schiff base functionalized UiO-66 for enhanced Cu (II) ion adsorption capacity and selectivity

被引:2
|
作者
Yang, Ying [1 ]
Wang, Yan [1 ]
Gou, Qiongxin [2 ]
Zhang, Yuanyuan [1 ]
Wu, Yuqi [1 ]
Luo, Yuhui [1 ]
机构
[1] Jiangsu Ocean Univ, Sch Environm & Chem Engn, Lianyungang 222005, Peoples R China
[2] Jiangsu Union Tech Inst, Lianyungang TCM Branch, Lianyungang 222005, Peoples R China
关键词
UiO-66; Thiophene schiff base; Substituted methyl group; Cu(II) ion adsorption; Density functional theory; METAL-ORGANIC FRAMEWORKS; AQUEOUS-SOLUTIONS; EFFECTIVE REMOVAL; PB(II); ADSORBENT; RECOVERY; BATCH; DFT; PERFORMANCE; MECHANISM;
D O I
10.1016/j.jssc.2024.124599
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Two UiO-66-supported thiophene Schiff base materials, UiO-66-TP and UiO-66-TPMe, were prepared for adsorbing Cu(II) ions from water. Both adsorbents exhibited improved Cu(II) adsorption performance compared to the precursor UiO-66-NH2. Experimental data confirmed that adsorption occurred via chemisorption on a monolayer, aligning with the pseudo-second-order kinetic and Langmuir isotherm models. In comparison to UiO66-TP which lacked a substituted group, UiO-66-TPMe exhibited a higher theoretical maximum adsorption capacity of 151.5 mg/g at pH 6.0. Thermodynamic experiments have shown that the uptake of Cu(II) was both endothermic and spontaneous in nature, leading to an increased disorder at the solid-solution interface. Moreover, in the presence of interfering metal ions, these two functionalized materials, based on thiophene Schiff base, demonstrated superior adsorption selectivity for Cu(II) compared to UiO-66-NH2. X-ray photoelectron spectroscopy analysis unveiled the coordination of Cu(II) with N and S atoms on the ligand during the adsorption process. Density functional theory calculations further supported a methyl substitution group on the thiophene Schiff base facilitated the binding of Cu(II) ions and a charge transfer occurred from the thiophene Schiff base ligands to Cu(II) ions upon complex formation.
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页数:14
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