ULTRA-LOW-NOISE 50-nm InGaAs mHEMT TECHNOLOGY AND MMICS FOR ROOM TEMPERATURE AND CRYOGENIC APPLICATIONS

被引:0
|
作者
Thome, F. [1 ]
John, L. [1 ]
Weber, R. [1 ]
Heinz, F. [1 ]
Massler, H. [1 ]
Leuther, A. [1 ]
Chartier, S. [1 ]
机构
[1] Fraunhofer Inst Appl Solid State Phys IAF, D-79108 Freiburg, Germany
关键词
High-electron-mobility transistors (HEMTs); low-noise amplifiers (LNAs); metamorphic HEMTs (mHEMTs); millimeter wave (mmW); monolithic microwave integrated circuits (MMICs); switches; METAMORPHIC HEMT TECHNOLOGY;
D O I
10.1109/IGARSS52108.2023.10281518
中图分类号
P [天文学、地球科学];
学科分类号
07 ;
摘要
This paper demonstrates a set of wideband state-of-the-art low-noise amplifier (LNA) monolithic microwave integrated circuits (MMICs) ranging from 2 to 190 GHz. All MMICs are fabricated in a 50-nm gate-length InGaAs metamorphic high-electron-mobility transistor (mHEMT) technology. The LNAs achieve state-of-the-art noise performance for MMICs at room temperature (RT) and cryogenic conditions. The paper discusses tradeoffs that need to be considerd when designing the input matching network: One can either target best noise at room or cryogenic temperature. A third option is to optimize for best S11. The discussion is exemplified with measurement results of three different W-band (75-110 GHz) LNAs. Linearity considerations are discussed based on bias-dependent single- and two-tone circuit measurements. An RF stress test and statistics over five wafer runs and 17 wafers of the measured noise performance of W-LNA1 MMICs complete the picture of a highly reliable InGaAs mHEMT technology with state-of-the-art RT and cryogenic noise performance.
引用
收藏
页码:1115 / 1118
页数:4
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