Suppression of particle formation by gas-phase pre-reactions in (100) MOVPE-grown β-Ga2O3 films for vertical device application

被引:10
|
作者
Chou, Ta-Shun [1 ]
Seyidov, Palvan [1 ]
Bin Anooz, Saud [1 ]
Grueneberg, Raimund [1 ]
Pietsch, Mike [1 ]
Rehm, Jana [1 ]
Tran, Thi Thuy Vi [1 ]
Tetzner, Kornelius [2 ]
Galazka, Zbigniew [1 ]
Albrecht, Martin [1 ]
Irmscher, Klaus [1 ]
Fiedler, Andreas [1 ]
Popp, Andreas [1 ]
机构
[1] Leibniz Inst Kristallzuchtung IKZ, D-12489 Berlin, Germany
[2] Ferdinand Braun Inst, Leibniz Inst Hochstfrequenztechn, D-12489 Berlin, Germany
关键词
SINGLE-CRYSTALS; SCATTERING;
D O I
10.1063/5.0133589
中图分类号
O59 [应用物理学];
学科分类号
摘要
This work investigated the metalorganic vapor-phase epitaxy (MOVPE) of (100) beta-Ga2O3 films with the aim of meeting the requirements to act as drift layers for high-power electronic devices. A height-adjustable showerhead achieving a close distance to the susceptor (1.5 cm) was demonstrated to be a critical factor in increasing the stability of the Ga wetting layer (or Ga adlayer) on the surface and reducing parasitic particles. A film thickness of up to 3 mu m has been achieved while keeping the root mean square below 0.7 nm. Record carrier mobilities of 155 cm(2) V-1 s(-1) (2.2 mu m) and 163 cm(2) V-1 s(-1) (3 mu m) at room temperature were measured for (100) beta-Ga2O3 films with carrier concentrations of 5.7 x 10(16) and 7.1 x 10(16) cm(-3), respectively. Analysis of temperature-dependent Hall mobility and carrier concentration data revealed a low background compensating acceptor concentration of 4 x 10(15) cm(-3). (c) 2023 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http:// creativecommons.org/licenses/by/4.0/).
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页数:6
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