Polarity-Induced Threshold Voltage Shift in Ovonic Threshold Switching Chalcogenides and the Impact of Material Composition

被引:8
|
作者
Ravsher, Taras [1 ,2 ]
Garbin, Daniele [2 ]
Fantini, Andrea [2 ]
Degraeve, Robin [2 ]
Clima, Sergiu [2 ]
Donadio, Gabriele Luca [2 ]
Kundu, Shreya [2 ]
Hody, Hubert [2 ]
Devulder, Wouter [2 ]
Van Houdt, Jan [1 ,2 ]
Afanas'ev, Valeri [1 ]
Delhougne, Romain [2 ]
Kar, Gouri Sankar [2 ]
机构
[1] Katholieke Univ Leuven, Dept Phys & Astron, Celestijnenlaan 200D, B-3001 Leuven, Belgium
[2] Imec, Semicond Technol & Syst, Kapeldreef 75, B-3001 Leuven, Belgium
来源
关键词
amorphous chalcogenides; ovonic threshold switches; polarity dependences; selectors; threshold voltages;
D O I
10.1002/pssr.202200417
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Amorphous chalcogenide-based ovonic threshold switch (OTS) selectors are an important part of the crosspoint memory arrays. It is known that the threshold voltage (V-th) of the OTS device can be affected by operating conditions, such as pulse amplitude and ramp rate. Herein, the impact of pulse polarity on OTS parameters is investigated. Recent findings on the polarity-induced V-th shift observed in SiGeAsTe and SiGeAsSe materials are summarized. This effect is manifested as a stable and reversible change in V-th resulting from the reversal of applied pulse polarity, thus allowing V-th to be electrically controlled. Herein, for the first time exceptionally large polarity-induced V-th shift in GeSe OTS is reported. The behavior observed in binary GeSe and quaternary SiGeAs(Te/Se) material systems is compared and the dependence of polarity effects on the composition of OTS devices is discussed. The impact of film thickness, interface, and stoichiometry in GeSe OTS is investigated.
引用
收藏
页数:9
相关论文
共 50 条
  • [41] Impact of changes in bond structure on ovonic threshold switching behaviour in GeSe2 (vol 35, pg 151, 2020)
    Keukelier, Jonas
    Opsomer, Karl
    Nuytten, Thomas
    Sergeant, Stefanie
    Devulder, Wouter
    Clima, Sergiu
    Goux, Ludovic
    Kar, Gouri Sankar
    Detavernier, Christophe
    JOURNAL OF MATERIALS CHEMISTRY C, 2021, 9 (02) : 736 - 736
  • [42] Simple Binary Ovonic Threshold Switching Material SiTe and Its Excellent Selector Performance for High-Density Memory Array Application
    Koo, Yunmo
    Lee, Sangmin
    Park, Seonggeon
    Yang, Minkyu
    Hwang, Hyunsang
    IEEE ELECTRON DEVICE LETTERS, 2017, 38 (05) : 568 - 571
  • [43] Positive Shift in Threshold Voltage Induced by CuO and NiOx Gate in AlGaN/GaN HEMTs
    Li, Yi
    Guo, Yaxiong
    Zhang, Kai
    Zou, Xuming
    Wang, Jingli
    Kong, Yuechan
    Chen, Tangsheng
    Jiang, Changzhong
    Fang, Guojia
    Liu, Chuansheng
    Liao, Lei
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2017, 64 (08) : 3139 - 3144
  • [44] Bias stress induced threshold voltage shift in pentacene thin-film transistors
    Kawakami, Daisuke
    Yasutake, Yuhsuke
    Nishizawa, Hideyuki
    Majima, Yutaka
    Japanese Journal of Applied Physics, Part 2: Letters, 2006, 45 (42-45):
  • [45] Reverse Gate Leakage Induced Buffer Charging and Threshold Voltage Shift of GaN HEMTs
    Yu, Hao
    Yadav, Sachin
    O'Sullivan, Barry
    Lin, Tzu-Heng
    Rathi, Aarti
    Alian, Alireza
    Wu, Tian-Li
    Elkashlan, Rana
    Banerjee, Sourish
    Peralagu, Uthayasankaran
    Parvais, Bertrand
    Collaert, Nadine
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2024, 71 (12) : 7308 - 7313
  • [46] Characterization of Threshold Voltage Shift in SiC MOSFETs Under Nanosecond-Range Switching and Its Impact on High-Frequency Applications
    Jiang, Junsong
    Tang, Xi
    Tan, Kun
    Hu, Zhihao
    Tian, Mohan
    Xu, Yichen
    Li, Haoran
    Zhu, Wenjie
    Li, Hui
    Hu, Cungang
    Cao, Wenping
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2024, 71 (07) : 4227 - 4232
  • [47] A Model for Photo-Induced Threshold Voltage Shift in a Transistor Based on a BTBT Derivative
    Fujieda, Ichiro
    Hoshino, Tomoya
    Hanasaki, Tomonori
    IDW/AD '12: PROCEEDINGS OF THE INTERNATIONAL DISPLAY WORKSHOPS, PT 2, 2012, 19 : 959 - 960
  • [48] Bias stress induced threshold voltage shift in pentacene thin-film transistors
    Kawakami, Daisuke
    Yasutake, Yuhsuke
    Nishizawa, Hideyuki
    Majima, Yutaka
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2006, 45 (42-45): : L1127 - L1129
  • [49] Threshold voltage shift induced by intrinsic stress in gate metal of AlGaN/GaN HFET
    Yazdani, Hossein
    Chevtchenko, Serguei
    Ostermay, Ina
    Wurfl, Joachim
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2021, 36 (05)
  • [50] Ovonic threshold switching behavior of Te-Ge-Se-Sc (TGSS): A rare-earth doped phase-change material
    Agarwal, Surbhi
    Dwivedi, D. K.
    Lohia, Pooja
    JOURNAL OF ALLOYS AND COMPOUNDS, 2024, 983