Performance measurement technique for 193-nm depolarizer

被引:0
|
作者
Zhang, Linghao [1 ,2 ]
Xia, Kegui [1 ,2 ]
Ma, Xinghua [1 ]
Zhu, Linglin [1 ]
Zeng, Aijun [1 ,2 ]
Huang, Huijie [1 ,2 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China
[2] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
来源
OPTICS AND LASER TECHNOLOGY | 2023年 / 159卷
关键词
193-nm immersion lithography; Brewster plate; Depolarizer; Polarization measurement; Signal denoising; LIGHT; FIBER; LASER; ILLUMINATION; GENERATION; POLARIZER;
D O I
10.1016/j.optlastec.2022.109028
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Herein, a performance measurement technique for 193-nm depolarizers, which is an area that still lacks research, is proposed and demonstrated. Utilizing a reflective fused-quartz Brewster wedge plate as a polarizer, a large beam at 193 nm is effectively polarized with a large separation angle, which is not possible with traditional polarization prisms. A pre-polarizing and beam-splitting structure is used to reduce power drift. A statistical method that makes full use of repeated measurements and priori knowledge (polarization decomposition and Malus' law) is developed to significantly improve measurement accuracy. Verification, functional, and repeatability tests are conducted. The experimental results are in good agreement with the theoretical analysis. This technique exhibits excellent accuracy and precision. It can be used for offline measurement of the depolarizer used in 193-nm immersion lithography, which is of considerable significance. Furthermore, the results provide important insights for related works on high-accuracy polarization measurement at ultra-short wavelengths.
引用
收藏
页数:7
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