High-irradiance illumination system for transmission extreme ultraviolet microscopy

被引：1

作者：

Waki, Shuntaro ^{[1
]}

Uchida, Takayuki ^{[1
]}

Chen, Jun ^{[1
]}

Toyoda, Mitsunori ^{[1
]}

机构：

[1] Tokyo Polytech Univ, Grad Sch Engn, Dept Media Engn, 5-45-1 Iiyama Minami, Atsugi, Kanagawa 2430297, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2023年 / 62卷 / 05期

关键词：

X-RAY MICROSCOPY; POLYMER BLENDS; ELECTRON-MICROSCOPY; MICROMECHANICAL DEFORMATION; MECHANISMS; FRACTURE;

D O I：

10.35848/1347-4065/accd32

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A high-irradiance illumination system with normal- incidence multilayer mirrors is developed. The system consists of two concave Mo/Si multilayer mirrors with aspherical substrates that provide critical illumination by imaging a laser-produced plasma (LPP) light source at a wavelength of 13.6 nm with a magnification of almost unity. By effectively correcting spherical aberration, a raytracing computation indicates that the irradiance on the sample can be increased by about four times compared to that for a conventional system with spherical mirrors. We experimentally confirmed the enhancement by combining a LPP light source with aspherical mirrors fabricated by magneto rheological finishing. (c) 2023 The Japan Society of Applied Physics

引用

页数：4

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