Epitaxial growth of (Ba0.7Sr0.3)TiO3 thin films on GdScO3 substrates by magnetron sputtering

被引:1
|
作者
Ye, Dongjin [1 ]
Nie, Penghao [1 ]
Jiang, Shuwen [1 ]
Zhang, Wanli [1 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Device, Chengdu 611731, Sichuan, Peoples R China
关键词
DIELECTRIC-PROPERTIES; RELAXATION;
D O I
10.1063/5.0145137
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Epitaxial growth of Ba0.7Sr0.3TiO3 (BST70) thin films on GdScO3 (GSO) substrates had been realized using the radio frequency magnetron sputtering system with the epitaxial alignment [001](BST70)||[110](GSO) and [010](BST70)||[001](GSO). Reciprocal space mapping and transmission electron microscope results confirm the epitaxial growth without an impurity phase at the interface. The Fourier-filtered image shows that the BST70 thin film grew well with few dislocations. The out-of-plane parameter of the as-deposited film was elongated due to strain, which was induced by the differences in the thermal expansion coefficients between the film and the substrate, and oxygen vacancies. The highly strained as-deposited BST70 films could be relaxed by the post-annealing procedure at 800 degrees C in an O-2-rich atmosphere for better epitaxial quality.
引用
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页数:5
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