An in situ elemental migration on a nanosize Cu-Sn interface in a microscope

被引:0
|
作者
Li, Ang [1 ]
Tao, Yu [1 ]
Lu, Hui [1 ]
Qiao, Shihang [1 ]
Liu, Shanshan [1 ]
Jiao, Yilin [1 ]
Xie, Lilin [1 ]
Chen, Yanhui [1 ]
机构
[1] Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
基金
国家重点研发计划;
关键词
Cu-Sn; Diffusion couple; Interface; In situ; TEM; SOLDER; DIFFUSION; INTERDIFFUSION; DISSOLUTION; BEHAVIOR; KINETICS;
D O I
10.1016/j.jmrt.2023.09.131
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Elemental migration between different elements is intrinsic process for diffusion. Most of the study focused on the presentative shape or size on of Kirkendall pores, yet on the in-termediate migration process. A dynamic elemental transition trajectory recording pro -vides realtime diffusion process on a Cu-Sn nanoscale interface is thus necessary to disclose intermediated reaction on diffusion process. In this work, elemental dynamic diffusion processes were recorded and analysed on a microsize Cu-Sn couple lamella by in situ transmission electron microscopy up to Sn melting point. Factors of atomic quantity, contact condition and temperatures were studied on its diffusion behaviours. The work shed new light on conventional metallographically interfaces diffusion and provide intrinsic clues for solder design.(c) 2023 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).
引用
收藏
页码:7757 / 7766
页数:10
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