β-Ga2O3 Lateral Schottky Barrier Diodes With > 10 kV Breakdown Voltage and Anode Engineering

被引:16
|
作者
Wang, Chenlu [1 ]
Yan, Qinglong [1 ]
Zhang, Chaoqun [1 ]
Su, Chunxu [1 ]
Zhang, Kun [1 ]
Sun, Sihan [1 ]
Liu, Zhihong [2 ]
Zhang, Weihang [2 ]
Alghamdi, Sami [3 ]
Ghandourah, Emad [3 ]
Zhang, Chunfu [1 ]
Zhang, Jincheng [1 ,2 ]
Zhou, Hong [1 ,2 ]
Hao, Yue [1 ]
机构
[1] Xidian Univ, Sch Microelect, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
[2] Xidian Univ, Guangzhou Inst Technol, Guangzhou Wide Bandgap Semicond Innovat Ctr, Guangzhou 510555, Peoples R China
[3] King Abdulaziz Univ, Dept Elect & Comp Engn, Jeddah 21589, Saudi Arabia
关键词
Ga2O3; lateral Schottky barrier diode; post anode deposition annealing; field-plate; breakdown voltage; BV2/R-ON; R-SP; PERFORMANCE; GW/CM(2); FIGURE;
D O I
10.1109/LED.2023.3309674
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, we demonstrated beta-Ga2O3 lateral Schottky barrier diodes (SBDs) with breakdown voltage (BV) over 10 kV via anode engineering techniques. Post-anode deposition annealing (PAA) was implemented to enhance the Schottky barrier height (SBH) to minimize the leakage current and suppress the interface state density (D-it) by over 1 order of magnitude. It is found that the D-it was extracted to be only 3 x 10(10) cm(-2)eV-1 at the energy level near the conduction band after the PAA treatment. Benefiting from the PAA and the coupled as well as the carefully designed dual field-plate (FP) structure, the BV of the SBD was enhanced from about 4 kV to over 10 kV while the turn-on voltage (V-on) for those SBDs remained approximately at 1 V. These findings show the immense potential of anode engineered Ga2O3 diodes for future high-voltage and high-power electronic systems.
引用
收藏
页码:1684 / 1687
页数:4
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