Theoretical Basis for the Photoelastic Residual Stress Evaluation in Misaligned Cubic Crystals

被引:0
|
作者
Davi, Fabrizio [1 ,2 ,3 ]
Rinaldi, Daniele [2 ,4 ,5 ]
Montalto, Luigi [2 ,4 ,5 ]
机构
[1] Univ Politecn Marche, DICEA, I-60131 Ancona, Italy
[2] Univ Politecn Marche, ICRYS, I-60131 Ancona, Italy
[3] Ist Nazl Fis Nucl, Sect Ferrara, I-44122 Ferrara, Italy
[4] Univ Politecn Marche, SIMAU, I-60131 Ancona, Italy
[5] Ist Nazl Fis Nucl, Sect Frascati, I-00044 Frascati, Italy
关键词
photoelasticity; cubic crystals; refraction index; residual stress analysis; RIETVELD REFINEMENT; ELASTIC-STRAIN;
D O I
10.3390/cryst13050759
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Photoelasticity is a fast and powerful technique for internal stress detection and quality control in crystals; to fully exploit its possibilities, an appropriate theoretical analysis must be developed for different crystallographic structure and observation planes. For a cubic crystal specimen whose geometry is non-coherent with its crystallographic directions (i.e., observation planes and crystallographic directions are not parallel), we write a set of equations that allow an estimate of the refraction indices as a function of the residual stress. This is obtained upon the assumption that the residual stress may be represented by a plane stress parallel to the observation face. For cubic crystals, we obtain an explicit estimate of the residual stress intensity; this can be achieved provided we know the piezo-optic tensor component, the orientation of two non-parallel specimen faces with respect to the crystallographic axes, and that we can measure the principal directions of the refractive indices on the observation face.
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页数:13
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