Synergistic Radiation Effects in PPD CMOS Image Sensors Induced by Neutron Displacement Damage and Gamma Ionization Damage

被引:1
|
作者
Wang, Zu-Jun [1 ,2 ]
Xue, Yuan-Yuan [1 ]
Tang, Ning [2 ]
Huang, Gang [2 ]
Nie, Xu [2 ]
Lai, Shan-Kun [2 ]
He, Bao-Ping [1 ]
Ma, Wu-Ying [1 ]
Sheng, Jiang-Kun [1 ]
Gou, Shi-Long [1 ]
机构
[1] Northwest Inst Nucl Technol, Natl Lab Intense Pulsed Irradiat Simulat & Effect, Xian 710024, Peoples R China
[2] Xiangtan Univ, Sch Mat Sci & Engn, Xiangtan 411105, Peoples R China
基金
美国国家科学基金会;
关键词
CMOS image sensor (CIS); dark signal; dark signal non-uniformity (DSNU); displacement damage; gamma ray; neutron; radiation; synergistic effect; total ionizing dose (TID); DEGRADATION;
D O I
10.3390/s24051441
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
The synergistic effects on the 0.18 mu m PPD CISs induced by neutron displacement damage and gamma ionization damage are investigated. The typical characterizations of the CISs induced by the neutron displacement damage and gamma ionization damage are presented separately. The CISs are irradiated by reactor neutron beams up to 1 x 1011 n/cm2 (1 MeV neutron equivalent fluence) and 60Co gamma-rays up to the total ionizing dose level of 200 krad(Si) with different sequential order. The experimental results show that the mean dark signal increase in the CISs induced by reactor neutron radiation has not been influenced by previous 60Co gamma-ray radiation. However, the mean dark signal increase in the CISs induced by 60Co gamma-ray radiation has been remarkably influenced by previous reactor neutron radiation. The synergistic effects on the PPD CISs are discussed by combining the experimental results and the TCAD simulation results of radiation damage.
引用
收藏
页数:13
相关论文
共 50 条
  • [41] Impact of neutron-induced displacement damage on the single event latchup sensitivity of bulk CMOS SRAM
    Pan, Xiao-Yu
    Guo, Hong-Xia
    Luo, Yin-Hong
    Zhang, Feng-Qi
    Ding, Li-Li
    Wei, Jia-Nan
    Zhao, Wen
    CHINESE PHYSICS B, 2017, 26 (01)
  • [42] Experiment and Analysis of Proton Displacement Damage Effect of CMOS Image Sensor
    Yang Jiecheng
    Yin Qian
    Guo Gang
    Zhang Yanwen
    Li Li
    Zhong Xiangli
    ACTA OPTICA SINICA, 2024, 44 (13)
  • [43] Single particle transient response and displacement damage in CMOS image sensors induced by high energy neutrons at Back-n in CSNS facility
    Wang, Zujun
    Xue, Yuanyuan
    Chen, Wei
    Ning, Hao
    Xu, Rui
    Guo, Xiaoqiang
    Sheng, Jiangkun
    Yao, Zhibin
    He, Baoping
    Ma, Wuying
    Dong, Guantao
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2019, 920 : 68 - 72
  • [44] Radiation damage analysis of a commercial optical CMOS image sensor
    Vodnala, Preeti
    Haji-Sheikh, Micheal
    Lurio, Lawrence
    2007 IEEE INSTRUMENTATION & MEASUREMENT TECHNOLOGY CONFERENCE, VOLS 1-5, 2007, : 1064 - 1069
  • [45] PROTON, NEUTRON, AND ELECTRON-INDUCED DISPLACEMENT DAMAGE IN GERMANIUM
    MARSHALL, PW
    DALE, CJ
    SUMMERS, GP
    WOLICKI, EA
    BURKE, EA
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1989, 36 (06) : 1882 - 1888
  • [46] Synergistic effects of displacement damage and helium on microstructural evolution and radiation-induced hardening of reduced activation ferritic/martensitic steel
    Ogiwara, H
    Kohyama, A
    Hinoki, T
    FUSION SCIENCE AND TECHNOLOGY, 2005, 47 (04) : 866 - 870
  • [47] STUDY OF IONIZATION-INDUCED RADIATION DAMAGE IN MGO
    CHEN, Y
    SIBLEY, WA
    PHYSICAL REVIEW, 1967, 154 (03): : 842 - &
  • [48] DISPLACEMENT DAMAGE AND RADIATION EFFECTS IN BORON IMPLANTED SAPPHIRE
    RUSSELL, TJ
    ROYCE, BSH
    HARARI, E
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1975, 22 (06) : 2250 - 2252
  • [49] DISPLACEMENT DAMAGE ANALOGS TO IONIZING-RADIATION EFFECTS
    SUMMERS, GP
    BURKE, EA
    XAPSOS, MA
    RADIATION MEASUREMENTS, 1995, 24 (01) : 1 - 8
  • [50] Neutron induced ionization damage in MOS capacitor and MOSFET structures
    Vaidya, SJ
    Sharma, DK
    Chandorkar, AN
    PROCEEDINGS OF THE ELEVENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOL 1 & 2, 2002, 4746 : 733 - 736