Fabrication of Specimens for Atom Probe Tomography Using a Combined Gallium and Neon Focused Ion Beam Milling Approach

被引:3
|
作者
Allen, Frances, I [1 ,2 ]
Blanchard, Paul T. [3 ]
Lake, Russell [3 ]
Pappas, David [3 ]
Xia, Deying [4 ,5 ]
Notte, John A. [4 ]
Zhang, Ruopeng [1 ,2 ]
Minor, Andrew M. [1 ,2 ]
Sanford, Norman A. [3 ]
机构
[1] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[2] Lawrence Berkeley Natl Lab, Natl Ctr Electron Microscopy, Mol Foundry, Berkeley, CA 94720 USA
[3] NIST, Phys Measurement Lab, Boulder, CO 80305 USA
[4] Carl Zeiss SMT Inc, Danvers, MA 01923 USA
[5] Rigetti Comp Inc, Berkeley, CA 94710 USA
关键词
atom probe tomography; focused ion beam; gas field ionization source; neon ions; MICROSCOPE; VOLTAGE; SAMPLE;
D O I
10.1093/micmic/ozad078
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We demonstrate a new focused ion beam sample preparation method for atom probe tomography. The key aspect of the new method is that we use a neon ion beam for the final tip-shaping after conventional annulus milling using gallium ions. This dual-ion approach combines the benefits of the faster milling capability of the higher current gallium ion beam with the chemically inert and higher precision milling capability of the noble gas neon ion beam. Using a titanium-aluminum alloy and a layered aluminum/aluminum-oxide tunnel junction sample as test cases, we show that atom probe tips prepared using the combined gallium and neon ion approach are free from the gallium contamination that typically frustrates composition analysis of these materials due to implantation, diffusion, and embrittlement effects. We propose that by using a focused ion beam from a noble gas species, such as the neon ions demonstrated here, atom probe tomography can be more reliably performed on a larger range of materials than is currently possible using conventional techniques.
引用
收藏
页码:1628 / 1638
页数:11
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