Effect of substrate temperature on structure, morphology and optical properties of Sb2Se3 thin films fabricated by chemical-molecular beam deposition method from Sb and Se precursors for solar cells
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作者:
Razykov, T. M.
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Phys Tech Inst, Chingiz Aytmatov St 2B, Tashkent 100084, UzbekistanPhys Tech Inst, Chingiz Aytmatov St 2B, Tashkent 100084, Uzbekistan
Razykov, T. M.
[1
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Bosio, A.
[2
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Kouchkarov, K. M.
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Phys Tech Inst, Chingiz Aytmatov St 2B, Tashkent 100084, UzbekistanPhys Tech Inst, Chingiz Aytmatov St 2B, Tashkent 100084, Uzbekistan
Kouchkarov, K. M.
[1
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Khurramov, R. R.
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Phys Tech Inst, Chingiz Aytmatov St 2B, Tashkent 100084, UzbekistanPhys Tech Inst, Chingiz Aytmatov St 2B, Tashkent 100084, Uzbekistan
Khurramov, R. R.
[1
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Tivanov, M. S.
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Belarusian State Univ, Fac Phys, Minsk 220030, BELARUSPhys Tech Inst, Chingiz Aytmatov St 2B, Tashkent 100084, Uzbekistan
Tivanov, M. S.
[3
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Bayko, D. S.
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Belarusian State Univ, Fac Phys, Minsk 220030, BELARUSPhys Tech Inst, Chingiz Aytmatov St 2B, Tashkent 100084, Uzbekistan
Bayko, D. S.
[3
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Romeo, A.
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Univ Verona, CaVignal 2-Str Grazie 15, I-37134 Verona, ItalyPhys Tech Inst, Chingiz Aytmatov St 2B, Tashkent 100084, Uzbekistan
Sb2Se3 thin films were obtained by chemical-molecular beam deposition on soda-lime glass from high purity Sb and Se precursors at 400 degrees C, 450 degrees C and 500 degrees C substrate temperature. Due to the precise control of the Sb/Se ratio, Sb2Se3 thin films with stoichiometric composition were obtained, which was confirmed by energy-dispersive X-ray microanalysis. The effect of substrate temperature on morphology, structure and optical properties of Sb2Se3 thin-films were studied by scanning electron microscopy, atomic force microscopy, X-ray diffraction, Raman spectroscopy and from the analysis of absorption and transmission spectra of the films. Average diameters and lengths of Sb2Se3 rods deposited at different substrate temperature were the range of 0.5-2 mu m and 1-4 mu m respectively which was grown at different slope and compactness to the substrate. The optical bandgap of the films was determined from the transmission and reflection spectra and 1.16, 1.21 and 1.26 eV band gap energies were observed for 500, 450 and 400 degree celsius substrate temperature Sb2Se3 thin films respectively.
机构:
Ningbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Zhejiang Key Lab Photoelect Mat & Devices, Ningbo 315211, Peoples R China
Engn Res Ctr Adv Infrared Photoelect Mat & Devices, Ningbo 315211, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Wang, Yingying
Liu, Xinli
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Ningbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Zhejiang Key Lab Photoelect Mat & Devices, Ningbo 315211, Peoples R China
Engn Res Ctr Adv Infrared Photoelect Mat & Devices, Ningbo 315211, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Liu, Xinli
Zheng, Jiacheng
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机构:
Ningbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Zhejiang Key Lab Photoelect Mat & Devices, Ningbo 315211, Peoples R China
Engn Res Ctr Adv Infrared Photoelect Mat & Devices, Ningbo 315211, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Zheng, Jiacheng
Liu, Xinyue
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机构:
Ningbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Zhejiang Key Lab Photoelect Mat & Devices, Ningbo 315211, Peoples R China
Engn Res Ctr Adv Infrared Photoelect Mat & Devices, Ningbo 315211, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Liu, Xinyue
Zhang, Peiqing
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机构:
Ningbo Univ, Res Inst Adv Technol, Ningbo 315211, Peoples R China
Zhejiang Key Lab Photoelect Mat & Devices, Ningbo 315211, Peoples R China
Engn Res Ctr Adv Infrared Photoelect Mat & Devices, Ningbo 315211, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Zhang, Peiqing
Lin, Changgui
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机构:
Ningbo Univ, Res Inst Adv Technol, Ningbo 315211, Peoples R China
Zhejiang Key Lab Photoelect Mat & Devices, Ningbo 315211, Peoples R China
Engn Res Ctr Adv Infrared Photoelect Mat & Devices, Ningbo 315211, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Lin, Changgui
Shen, Xiang
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机构:
Ningbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Zhejiang Key Lab Photoelect Mat & Devices, Ningbo 315211, Peoples R China
Ningbo Univ, Ningbo Inst Oceanog, Ningbo 315211, Peoples R China
Engn Res Ctr Adv Infrared Photoelect Mat & Devices, Ningbo 315211, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Shen, Xiang
Dai, Shixun
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机构:
Ningbo Univ, Res Inst Adv Technol, Ningbo 315211, Peoples R China
Zhejiang Key Lab Photoelect Mat & Devices, Ningbo 315211, Peoples R China
Engn Res Ctr Adv Infrared Photoelect Mat & Devices, Ningbo 315211, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Dai, Shixun
Song, Baoan
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h-index: 0
机构:
Ningbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China
Zhejiang Key Lab Photoelect Mat & Devices, Ningbo 315211, Peoples R China
Engn Res Ctr Adv Infrared Photoelect Mat & Devices, Ningbo 315211, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Peoples R China