The authors respond

被引：1

|

作者：

Janket, S-j. ^{[1
]}

Van Dyke, T. E. ^{[1
]}

Meurman, J. H. ^{[2
]}

机构：

[1] Forsyth Inst, Cambridge, MA 02142 USA

[2] Univ Helsinki, Helsinki Univ Hosp, Helsinki, Finland

来源：

BRITISH DENTAL JOURNAL | 2023年 / 234卷 / 11期

关键词：

PHYSICAL-ACTIVITY; BIAS; RISK;

D O I：

10.1038/s41415-023-5950-2

中图分类号：

R78 [口腔科学];

学科分类号：

1003 ;

摘要：

引用

收藏

页码：783 / 784

页数：2

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