In this work, the performance of a heterostructure molybdenum ditelluride (MoTe2/MoSe2 and MoTe2/WSe2) double-gate (DG) metal-oxide-semiconductor field-effect transistor (MOSFET) was investigated using a hybrid methodology. The device characteristics were obtained using 2H-type bilayer MoTe2 and a heterobilayer of MoTe2/MoSe2 and MoTe2/WSe2 as channel material in a DG MOSFET. The methodology uses both the QuantumWise Atomistix ToolKit (ATK) and Sentaurus TCAD (technology computer-aided design) tool to simulate the device characteristics. First, density functional theory was used to simulate the electrical parameters of bilayer 2H-MoTe2, heterobilayer MoTe2/MoSe2, and MoTe2/WSe2. The parameters (bandgap and effective mass, mobility, etc.) obtained using the atomistic simulator tool were exported into Sentaurus TCAD to simulate the drain current characteristics, such as on-current (I-on), I-on/I-off ratio, subthreshold swing, and threshold voltage. The noise performance of the devices was also studied for the heterostructure DG MOSFET using impedance field method and compared with its bilayer MoTe2 counterpart values. Noise parameters such as noise power spectral density (S-ID) and noise figure as a function of both frequency and bias were also simulated, and noise components such as generation-recombination (G-R) noise, flicker noise, and white noise were obtained.
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Tao, Zui
Shen, Bowen
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Shen, Bowen
Zhao, Wenjin
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Kavli Inst Cornell Nanoscale Sci, Ithaca, NY 14850 USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Zhao, Wenjin
Hu, Nai Chao
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Univ Texas Austin, Dept Phys, Austin, TX USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Hu, Nai Chao
Li, Tingxin
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Li, Tingxin
Jiang, Shengwei
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Jiang, Shengwei
Li, Lizhong
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Li, Lizhong
Watanabe, Kenji
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Natl Inst Mat Sci, Tsukuba, JapanCornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Watanabe, Kenji
Taniguchi, Takashi
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Natl Inst Mat Sci, Tsukuba, JapanCornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Taniguchi, Takashi
MacDonald, Allan H.
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Univ Texas Austin, Dept Phys, Austin, TX USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
MacDonald, Allan H.
Shan, Jie
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Kavli Inst Cornell Nanoscale Sci, Ithaca, NY 14850 USA
Cornell Univ, Lab Atom & Solid State Phys, Ithaca, NY 14850 USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Shan, Jie
Mak, Kin Fai
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
Kavli Inst Cornell Nanoscale Sci, Ithaca, NY 14850 USA
Cornell Univ, Lab Atom & Solid State Phys, Ithaca, NY 14850 USACornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14850 USA
机构:Jawaharlal Nehru Centre for Advanced Scientific Research,New Chemistry Unit, School of Advanced Materials, International Centre for Material Science and Sheikh Saqr Laboratory
Devesh Chandra Binwal
Manjodh Kaur
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机构:Jawaharlal Nehru Centre for Advanced Scientific Research,New Chemistry Unit, School of Advanced Materials, International Centre for Material Science and Sheikh Saqr Laboratory
Manjodh Kaur
K Pramoda
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机构:Jawaharlal Nehru Centre for Advanced Scientific Research,New Chemistry Unit, School of Advanced Materials, International Centre for Material Science and Sheikh Saqr Laboratory
K Pramoda
C N R Rao
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机构:Jawaharlal Nehru Centre for Advanced Scientific Research,New Chemistry Unit, School of Advanced Materials, International Centre for Material Science and Sheikh Saqr Laboratory