Scalable and Stable Manufacture of Molecular-Sized Silica Nanoparticles by Evaporation-Induced Self-Assembly

被引:3
|
作者
Sakamoto, Shigeru [1 ]
Houya, Takumi [2 ]
Matsuno, Takamichi [2 ,3 ]
Shimojima, Atsushi [2 ,3 ]
机构
[1] Sony Grp Corp, R&D Ctr, Atsugi, Kanagawa 2430014, Japan
[2] Waseda Univ, Sch Adv Sci & Engn, Dept Appl Chem, Tokyo 1698555, Japan
[3] Waseda Univ, Kagami Mem Res Inst Mat Sci & Technol, Tokyo 1690051, Japan
关键词
GROWTH; NANOSPHERES; DYNAMICS; GLASS;
D O I
10.1021/acs.chemmater.3c00500
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Silica nanoparticles on the single-nanometerscale are promisingbuilding blocks for the construction of functional nanomaterials.Generally, silica nanoparticles are formed via controlled nucleationand growth in dilute aqueous solutions to avoid aggregation, whichhampers their large-scale production and surface modification withorganochlorosilanes. Herein, we report a simple and scalable processto prepare uniform and unprecedentedly small silica nanoparticles(& SIM;2 nm in size) via the evaporation-induced self-assembly ofsilicate species and surfactants in a rotary evaporator. The as-synthesizedreverse-type silica-surfactant mesostructured composite wasdisassembled in tetrahydrofuran to obtain a clear colloidal dispersion.Surface modification was achieved by direct silylation of the mesostructuredcomposite with organochlorosilanes. Small-angle X-ray scattering analysisof the nanoparticle dispersion after surface trimethylsilylation indicatedthe absence of larger nanoparticles. The trimethylsilylated nanoparticleswere assembled by solvent evaporation to form a transparent film.Nanoindentation tests revealed that this nanoparticle film exhibitedplasticity and softness similar to organic polymers. Additionally,the thermal stability became significantly higher (10% weight lossat & SIM;500 & DEG;C in the air) when the surface was modified withdimethylsilyl (Me2Si(OSi)(2)) groups. These featuresof the silica nanoparticles prepared using our method have promisingapplications in emerging fields.
引用
收藏
页码:5838 / 5844
页数:7
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