Dual effects of reduced modulus on abrasive wear resistance of polyurethanes

被引:2
|
作者
Ding, Caijun [1 ,2 ]
Wang, Zehao [1 ,2 ]
Xing, Zeyu [1 ,2 ]
Wang, Jie [1 ]
Fang, Qinghua [3 ]
Zhao, Xiaoli [1 ]
Yang, Xiaoniu [1 ,2 ]
机构
[1] Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
[2] Univ Sci & Technol China, Sch Appl Chem & Engn, Hefei 230026, Peoples R China
[3] Tsinghua Univ, State Key Lab Tribol Adv Equipment, Beijing 100084, Peoples R China
基金
中国国家自然科学基金; 中国博士后科学基金;
关键词
Polyurethane; Abrasive wear; Reduced modulus; Dual effects; SCRATCH BEHAVIOR; MICROCHIPS MORPHOLOGY; METALLIC MATERIALS; SIZE; LOAD; NANOCOMPOSITES; MECHANISM; HARDNESS; TESTS;
D O I
10.1016/j.triboint.2023.108826
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
For the widely used elastomers, the relationship between modulus and wear resistance was still unclear, which hindered the development of highly wear-resistant materials. In this work, the effect of reduced modulus on abrasive wear behavior of polyurethanes (PUs) was investigated. It demonstrated that at low load, an increase in reduced modulus led to a deteriorated wear resistance due to significant stress concentration. However, at high load, the increased reduced modulus reduced the contact area, and thus improved wear resistance. This was the first time to reveal the dual effect of reduced modulus on wear resistance of elastomers with the change of loads. These findings would contribute to the development of wear-resistant PUs to meet different working conditions.
引用
收藏
页数:11
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