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- [21] THE DESIGN OF NEW PHOTORESISTS FOR DEEP UV LITHOGRAPHY ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1983, 185 (MAR): : 10 - ORPL
- [22] POLYSILANES - PHOTOCHEMISTRY AND DEEP-UV LITHOGRAPHY POLYMER ENGINEERING AND SCIENCE, 1989, 29 (13): : 882 - 886
- [23] ULTRAFAST DEEP UV LITHOGRAPHY WITH EXCIMER LASERS ELECTRON DEVICE LETTERS, 1982, 3 (03): : 53 - 55
- [24] Nonchemically amplified resists for deep UV lithography ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
- [27] Comparison of the Performance of SERS Substrates Fabricated by Deep UV Lithography and Nanosphere Lithography XXII INTERNATIONAL CONFERENCE ON RAMAN SPECTROSCOPY, 2010, 1267 : 956 - 956
- [28] ULTRAFAST DEEP UV LITHOGRAPHY USING EXCIMER LASERS POLYMER ENGINEERING AND SCIENCE, 1983, 23 (18): : 1019 - 1021
- [29] POLYSILANES - SOLUTION PHOTOCHEMISTRY AND DEEP-UV LITHOGRAPHY ACS SYMPOSIUM SERIES, 1989, 412 : 115 - 132
- [30] PLASMA SOURCES FOR DEEP-UV LITHOGRAPHY. VLSI Electronics, Microstructure Science, 1984, 8 : 171 - 186