Stress-Free Highly Reflective Multilayer Mo/Be/Si Mirrors for Operation in the Vicinity of the Wavelength 13.5 nm

被引：0

作者：

Smertin, R. M. ^{[1
]}

Zuev, S. Yu. ^{[1
]}

Polkovnikov, V. N. ^{[1
]}

Chkhalo, N. I. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 607680, Russia

来源：

JOURNAL OF SURFACE INVESTIGATION | 2023年 / 17卷 / SUPPL 1期

基金：

俄罗斯科学基金会;

关键词：

multilayer mirrors; X-ray radiation; extreme ultraviolet (EUV) lithography; maskless lithography; internal stresses; FILMS; MO;

D O I：

10.1134/S1027451023070492

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Multilayer Mo/Be/Si mirrors with different ratios of Si- and Be-layer thicknesses in a period are considered. It is shown that the substitution of silicon with beryllium in the Mo/Si system makes it possible to completely eliminate internal stresses in the Mo/Be/Si structure. Layer thicknesses are found (Si similar to 0.9 nm, Mo similar to 2.8 nm, and Be similar to 3.3 nm) that simultaneously provide high reflection coefficients (R similar to 66-67%) at a wavelength of 13.5 nm and zero values of internal stresses.

引用

页码：S239 / S243

页数：5