Planar Quasi-1D Nano-Interconnects Based on Selective Edge Passivated ZnO Nanoribbons

被引:2
|
作者
Krishna, M. Sankush [1 ]
Singh, Sangeeta [1 ]
Kaushik, Brajesh Kumar [2 ]
机构
[1] Natl Inst Technol, Microelect & VLSI Lab, Patna 800005, India
[2] Indian Inst Technol Roorkee, Dept Elect & Commun Engn, Roorkee 247667, India
关键词
Nanoribbons; Zinc oxide; II-VI semiconductor materials; Nanoscale devices; Graphene; Zinc; Hydrogen; ZnO nanoribbons; density functional theory; non-equilibrium Green's function; edge-passivation; transport properties; and nano-interconnects; ELECTRONIC-PROPERTIES; GRAPHENE NANORIBBON; GROWTH; RELIABILITY; RESISTANCE; NANOSCALE; CROSSTALK; FUTURE; LAYERS;
D O I
10.1109/TNANO.2023.3314068
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This work reports nano-interconnect properties in selective edge passivated zigzag ZnO nanoribbons (ZnONRs) by deploying the density functional theory (DFT) in conjugation with non-equilibrium Green's function (NEGF) framework. Here, structural, electronic, and transport properties of selective edge passivated ZnONRs are explored in-depth to analyze their potentials as nano-interconnect. The bandstructure and density of states (DoS) reveal that the hydrogenated ZnONRs are semiconducting with 0.49 eV band gap. However, the selective edge passivation results in dangling bonds at any/both edges resulting in metallic behavior. Further, the I-V characteristics reveal that the bare Zn-edge device (ZnO-H) has linearly increasing current while the bare O-edge (H-ZnO) and both bare edged ZnO (bare-ZnO) demonstrate negative differential resistance (NDR) characteristics. The current magnitude in pristine devices is insignificant as compared to devices with at least one bare edge due to their semiconducting nature. The parameters that affect the nano-interconnects performance at nanoscale dimensions such as quantum resistance ($R_{Q}$), kinetic inductance ($L_{K}$), and quantum capacitance ($C_{Q}$) are reported as 6.46 k$\Omega$, 35.08 nH/$\mu$m, and 3.36 nF/m. Furthermore, the performance of ZnO-H devices as nano-interconnects is investigated through various analyses such as delay, stability, frequency response, crosstalk, and line resistance effects. The obtained results reveal the ZnO-H device has enough potential to be used as nano-Interconnect.
引用
收藏
页码:597 / 605
页数:9
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