Indentation size effect in exceptionally hard AlCu thin films

被引：6

作者：

Olasz, Daniel ^{[1
,2
]}

Safran, Gyorgy ^{[2
]}

Szasz, Noemi ^{[2
]}

Huhn, Gabriella ^{[1
]}

Nguyen Quang Chinh ^{[1
]}

机构：

[1] Eotvos Lorand Univ, Dept Mat Phys, Pazmany Peter Setany 1-A, H-1117 Budapest, Hungary

[2] Ctr Energy Res, Inst Tech Phys & Mat Sci, Konkoly Thege Ut 29-33, H-1121 Budapest, Hungary

来源：

MATERIALS LETTERS | 2023年 / 330卷

基金：

匈牙利科学研究基金会;

关键词：

High strength; Indentation size effect; Fine-grained structure; Grain boundary sliding; ELASTIC-MODULUS; TESTS;

D O I：

10.1016/j.matlet.2022.133409

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Dual DC magnetron sputtered AlCu thin films representing the whole composition range were investigated by depth-sensing indentation (DSI), transmission electron microscopy (TEM) and atomic force microscopy (AFM). Experimental results show exceptionally high hardness of -16 GPa in the middle concentration range of -40-70 at% Cu. Indentation tests also revealed phenomena related to indentation size-effect. At Al or Cu contents below 20 at%, the well-known size effect was not observed, which can be interpreted by the grain boundary sliding deformation mechanism of fine-grained films. In the middle range of the composition, the size effect can be clearly observed even against the fine grain structure. This is a consequence of the highly precipitated microstructure of these films, which leads to the indentation processes taking place in a manner more characteristic of amorphous materials.

引用

页数：4

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