Analysis of the Inhomogeneous Growth of Sputtered Black TiO2 Thin Films

被引:0
|
作者
Berends, Dennis [1 ]
Schwager, Patrick [1 ]
Gehrke, Kai [1 ]
Vehse, Martin [1 ]
Agert, Carsten [1 ]
机构
[1] DLR Inst Networked Energy Syst Urban & Residential, D-26129 Oldenburg, Germany
来源
ACS OMEGA | 2024年 / 9卷 / 13期
关键词
MECHANISM;
D O I
10.1021/acsomega.3c09772
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Black titanium dioxide (B-TiO2) is a highly active photoelectrochemical material compared to pure titanium dioxide due to its increased light absorption properties. Recently, we presented the deposition of thin-film B-TiO2 using an asymmetric bipolar reactive magnetron sputter process. The resulting samples exhibit excellent photoelectrochemical properties, which can be fine-tuned by varying the process parameters. In this article, results of morphological, electrical, and photoelectrochemical measurements are discussed to better understand the surprisingly high electrochemical activity of the films. In order to study the influence of the dynamic process on film formation, we use static sputtering with a fixed substrate covering the entire chamber area in front of the two targets. This allows the material composition of the sputtered film to be analyzed depending on its relative position to the targets. The results lead to the conclusion that the asymmetric bipolar sputtering mainly produces two phases, a transparent, nonconductive crystalline phase and a black, conductive amorphous phase. As a consequence, the dynamically sputtered samples are multilayers of these two materials. We discuss that the significantly better electrical and photoelectrochemical properties emerge from the inhomogeneous nature of the laminates, like also found in core-shell nanoparticles of B-TiO2.
引用
收藏
页码:15251 / 15258
页数:8
相关论文
共 50 条
  • [21] Influence of Deposition Time on Properties of the RF Sputtered TiO2 Thin Films
    Chaabouni, F.
    Costa, L. C.
    Selmi, M.
    Abaab, M.
    Rezig, B.
    ADVANCED MATERIALS FORUM IV, 2008, 587-588 : 824 - +
  • [22] Effect of the substrate temperature on the properties of the RF sputtered TiO2 thin films
    Ben Mbarek, I.
    Chaabouni, F.
    Selmi, M.
    Abaab, M.
    Rezig, B.
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 7, NO 9, 2010, 7 (09):
  • [23] EFFECT OF RADIO FREQUENCY POWER ON MAGNETRON SPUTTERED TIO2 THIN FILMS
    Satheesh, R.
    Sankar, S.
    Gopchandran, K. G.
    PLASMA AND FUSION SCIENCE: FROM FUNDAMENTAL RESEARCH TO TECHNOLOGICAL APPLICATIONS, 2018, : 185 - 201
  • [24] Properties of sputtered TiO2 thin films as a function of deposition and annealing parameters
    Pjevic, Dejan
    Obradovic, Marko
    Marinkovic, Tijana
    Grce, Ana
    Milosavljevic, Momir
    Grieseler, Rolf
    Kups, Thomas
    Wilke, Marcus
    Schaaf, Peter
    PHYSICA B-CONDENSED MATTER, 2015, 463 : 20 - 25
  • [25] Structural Characterization of DC Magnetron-Sputtered TiO2 Thin Films
    Kobkultanachai, Kanokwan
    Chaiyakun, Surasing
    Thamaphat, Kheamrutai
    Naemchanthara, Kittisakchai
    Limsuwan, Pichet
    PROCEEDINGS OF 48TH KASETSART UNIVERSITY ANNUAL CONFERENCE: SCIENCE, 2010, : 328 - 335
  • [26] DIELECTRIC PROPERTIES OF SPUTTERED TIO2 FILMS
    TAKEUCHI, M
    ITOH, T
    NAGASAKA, H
    THIN SOLID FILMS, 1978, 51 (01) : 83 - 88
  • [27] PHOTOCONDUCTIVE PROPERTIES OF SPUTTERED TIO2 FILMS
    TAKEUCHI, M
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 55 (02): : 653 - 659
  • [28] MEASUREMENT OF THE EXTINCTION OF SPUTTERED TIO2 FILMS
    WELSCH, E
    LIEDER, G
    WALTHER, HG
    HACKER, E
    THIN SOLID FILMS, 1982, 91 (04) : 321 - 325
  • [29] E-gun sputtered and reactive ion sputtered TiO2 thin films for gas sensors
    Edelman, F.
    Rothshild, A.
    Komem, Y.
    Mikhelashvili, V.
    Chack, A.
    Cosandey, F.
    Electron Technology (Warsaw), 2000, 33 (01): : 89 - 107
  • [30] Growth conditions and reflectance of D C magnetron sputtered TiO2 films
    Shenyang Institute of Aeronautical Engineering, Shenyang 110034, China
    不详
    不详
    不详
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2008, 28 (01): : 55 - 58