Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate-Experiment and theory

被引:3
|
作者
Stach, T. [1 ]
Seif, A. [2 ]
Ambrosetti, A. [2 ]
Silvestrelli, P. L. [2 ]
Burghaus, U. [1 ]
机构
[1] North Dakota State Univ, Dept Chem & Biochem, 11 Albrecht Blvd N, Fargo, ND 58102 USA
[2] Univ Padua, Dipartimento Fis & Astron, Via Marzolo 8, I-35131 Padua, Italy
来源
关键词
REACTION-KINETICS; HIGHLY EFFICIENT; DOPED GRAPHENE; ADSORPTION; OXIDATION; SO2; HYDROGEN; RU(0001); CATALYSIS; SULFUR;
D O I
10.1116/6.0002948
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Experimental and theoretical evidence is presented that a sulfur compound dissociates on clean, defect-free epitaxial graphene (Gr) in ultrahigh vacuum (UHV). Together with density functional theory calculations (DFT), experimental kinetics and spectroscopic data suggest an auto-(/self)catalytic process. The results could open a pathway to a carbocatalyst. While adsorbing H2S in UHV at low temperatures on single-layer graphene/ruthenium (Gr/Ru), H-2 desorbs and sulfur remains on the surface. Vacancy and grain boundary defects, respectively, can be excluded as active sites. DFT results indicate the importance of the Ru(0001) support in facilitating a reaction pathway with small activation energy for H2S dissociation. Gr becomes reactive due to a complex interplay of structural and electronic effects, including the corrugation of the graphene layer and the hybridization of ruthenium's d orbital with antibonding states of H2S.
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页数:7
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