Security and Reliability Challenges in Machine Learning for EDA: Latest Advances

被引:0
|
作者
Xie, Zhiyao [1 ]
Zhang, Tao [1 ]
Peng, Yifeng [1 ]
机构
[1] Hong Kong Univ Sci & Technol, Hong Kong, Peoples R China
来源
2023 24TH INTERNATIONAL SYMPOSIUM ON QUALITY ELECTRONIC DESIGN, ISQED | 2023年
关键词
D O I
10.1109/ISQED57927.2023.10129359
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
The growing IC complexity has led to a compelling need for design efficiency improvement through new electronic design automation (EDA) methodologies. In recent years, many innovative machine learning (ML)-based solutions have been proposed for EDA applications. While these ML solutions demonstrate great potential in the circuit design flow, however, the hidden security and model reliability problems are rarely discussed until recently. In this paper, we present some latest research advances in the security and reliability challenges in ML for EDA.
引用
收藏
页码:76 / 81
页数:6
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