Fabrication of CZTS Films through a Combined Electrodeposition and Solution Process: An Experimental and First-Principles Study

被引:0
|
作者
Katirci, Ramazan [1 ]
Onel, Mehmet Nurullah [2 ]
Danaci, Ilhan [3 ]
Danaci, Kevser Irem [4 ]
Ozbay, Salih [5 ]
Erden, Fuat [3 ]
机构
[1] Sivas Univ Sci & Technol, Dept Met & Mat Engn, TR-58000 Sivas, Turkiye
[2] Sivas Univ Sci & Technol, Dept Astronaut Engn, TR-58000 Sivas, Turkiye
[3] Sivas Univ Sci & Technol, Dept Aeronaut Engn, TR-58000 Sivas, Turkiye
[4] Sivas Univ Sci & Technol, Dept Elect & Elect Engn, TR-58000 Sivas, Turkiye
[5] Sivas Univ Sci & Technol, Dept Chem Engn, TR-58000 Sivas, Turkiye
关键词
CZTS; electrochemistry; electrodeposition; solution process; sulfur; CU2ZNSNS4; THIN-FILMS; SOLAR-CELL; COATING TECHNIQUE; LOW-COST; GROWTH; DEPOSITION; PHASE; NANOPARTICLES; SULFURIZATION; DESIGN;
D O I
10.1002/celc.202300162
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Sulfurization has a critical role in preparation of CZTS films since the main drawback of CZTS is due to the presence of S-based impurities. In general, sulfurization could be performed during or following annealing, or the entire CZTS structure could be prepared through sol-gel. However, toxic gases are used for the former, and the latter takes prolonged times. Alternatively, a combined electrodeposition and solution process was proposed in the present work to prepare CZTS. Briefly, we electrodeposited CZT layers on a metal substrate, and then immersed the as-prepared coating in a S containing solution for the sulfurization. The effects of electrodeposition time, electrodeposition order, current density, electrolyte compositions, sulfurization time, and annealing pressure were studied. Overall, the results show that S content of the films varied between 27 and 52 % depending on process parameters, thus, suggesting the effectiveness of the proposed approach regarding sulfurization. However, various secondary phases were also detected as well as considerable amount of oxygen impurity. Accordingly, we opted for a computational approach to elucidate the effect of oxygen impurities, and report that the band gap of the films varied between 0.59 and 0.05 eV depending on the presence and which sites oxygen atoms occupy.
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页数:11
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