Mechanical and Thermal Properties of W-Ta-B Coatings Deposited by High-Power Impulse Magnetron Sputtering (HiPIMS)

被引：1

作者：

Psiuk, Rafal ^{[1
]}

Moscicki, Tomasz ^{[1
]}

Chrzanowska-Gizynska, Justyna ^{[1
]}

Kurpaska, Lukasz ^{[2
]}

Radziejewska, Joanna ^{[3
]}

Denis, Piotr ^{[1
]}

Garbiec, Dariusz ^{[4
]}

Chmielewski, Marcin ^{[5
]}

机构：

[1] Polish Acad Sci, Inst Fundamental Technol Res, Pawinskiego 5B, PL-02106 Warsaw, Poland

[2] NOMATEN Ctr Excellence, Natl Ctr Nucl Res, Ul A Soltana 7, PL-05400 Otwock, Poland

[3] Warsaw Univ Technol, Fac Mech & Ind Engn, Narbutta 85, PL-02524 Warsaw, Poland

[4] Poznan Inst Technol, Lukasiewicz Res Network, 6 Ewarysta Estkowskiego St, PL-61755 Poznan, Poland

[5] Lukasiewicz Res Network, Inst Microelect & Photon, Ctr Funct Mat, 133 Wolczynska St, PL-01919 Warsaw, Poland

来源：

MATERIALS | 2023年 / 16卷 / 02期

关键词：

tungsten diboride; high power impulse magnetron sputtering (HiPIMS); hardness; thermal stability; oxidation resistance; STABILITY; TANTALUM;

D O I：

10.3390/ma16020664

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We present the deposition and characterization of tungsten-tantalum diboride (W,Ta)B-2 coatings prepared by the high-power impulse magnetron sputtering technique. We evaluated the influence of pulse duration and substrate bias on the properties of (W,Ta)B-2 films. A high hardness of up to 35 GPa measured by nanoindentation was simultaneously obtained with good elastic properties. Changing the pulse duration greatly affected the B/(W+Ta) atomic ratio, which influenced the properties of the coatings. The deposited films are thermally stable at up to 1000 degrees C in vacuum and are able to withstand oxidation at 500 degrees C.

引用

页数：12

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