The evolution of indium precipitation in gallium focused ion beam prepared samples of InGaAs/InAlAs quantum wells under electron beam irradiation

被引:2
|
作者
Liu, Shuo [1 ]
Dong, Jiawei [1 ]
Ma, Zhenyu [1 ]
Hu, Wenyu [2 ]
Deng, Yong [1 ,2 ]
Shi, Yuechun [3 ]
Wang, Xiaoyi [1 ]
Qiu, Yang [2 ]
Walther, Thomas [4 ]
机构
[1] Southwest Minzu Univ, Coll Elect & Informat, State Ethn Affairs Commiss, Chengdu, Peoples R China
[2] Southern Univ Sci & Technol, Pico Ctr, SUSTech Core Res Facil, Shenzhen 518055, Peoples R China
[3] Yongjiang Lab, Photon Technol Res Ctr, Ningbo, Peoples R China
[4] Univ Sheffield, Dept Elect & Elect Engn, Sheffield, England
基金
中国国家自然科学基金;
关键词
HAADF; In precipitation; InGaAs/InAlAs; QCL; STEM; SURFACE SEGREGATION;
D O I
10.1111/jmi.13251
中图分类号
TH742 [显微镜];
学科分类号
摘要
Gallium ion (Ga+) beam damage induced indium (In) precipitation in indium gallium arsenide (InGaAs)/indium aluminium arsenide (InAlAs) multiple quantum wells and its corresponding evolution under electron beam irradiation was investigated by valence electron energy loss spectroscopy (VEELS) and high-angle annular dark-field imaging (HAADF) in scanning transmission electron microscopy (STEM). Compared with argon ion milling for sample preparation, the heavier projectiles of Ga+ ions pose a risk to trigger In formation in the form of tiny metallic In clusters. These are shown to be sensitive to electron irradiation and can increase in number and size under the electron beam, deteriorating the structure. Our finding reveals the potential risk of formation of In clusters during focused ion beam (FIB) preparation of InGaAs/InAlAs quantum well samples and their subsequent growth under STEM-HAADF imaging, where initially invisible In clusters of a few atoms can move and swell during electron beam exposure.Lay description: In this paper, the evolution of Ga+ implantation induced In precipitation in InGaAs/InAlAs multiple quantum wells under electron beam irradiation was investigated by valence electron energy loss spectroscopy (VEELs), energy dispersive X-ray spectroscopy (EDXs) and high-angle annular dark-field (HAADF) imaging technique based in a probe aberration corrected scanning transmission electron microscope. In contrast to Ar+ ion bombardment, the projectile of focused Ga+ ions is able to trigger the clustering of In interstitials in InGaAs/InAlAs multiple quantum wells, which allows the formation of metallic In precipitates. Afterwards, by exploiting an extensive electron beam rastering on the region of In precipitation, the increase of electron irradiation time could lead to a pronounced swelling of In cluster size. Especially for the region contains In precipitates of several atoms, where the morphology of In cluster is invisible in atomic image. The continuous electron irradiation could give rise to the promotion of In clustering, allowing the structure of In precipitates been resolved by HAADF image. Our finding reveals the potential risk of formation of In precipitates during focused Ga+ ion beam bombarded InGaAs/InAlAs semiconductors and the subsequent evolution of In clustering under electron beam rastering. These findings emphasise the need for caution when studying FIB prepared In-based III-V quantum well specimens using TEM even in the In(Ga,Al)As system, as the initially formed In-rich clusters are so small they can remain invisible for some time.
引用
收藏
页码:169 / 176
页数:8
相关论文
共 50 条
  • [21] In-situ determination of indium segregation in InGaAs/GaAs quantum wells grown by molecular beam epitaxy
    Martini, S
    Quivy, AA
    BRAZILIAN JOURNAL OF PHYSICS, 2002, 32 (02) : 359 - 361
  • [22] Focused ion beam (FIB) milling of electrically insulating specimens using simultaneous primary electron and ion beam irradiation
    Stokes, D. J.
    Vystavel, T.
    Morrissey, F.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (03) : 874 - 877
  • [23] Application of a focused ion beam to prepare electron microscopy samples of surface nanostructures
    Volkov, R. L.
    Borgardt, N. I.
    Kukin, V. N.
    Prikhod'ko, A. S.
    Basaev, A. S.
    Shaman, Yu. P.
    JOURNAL OF SURFACE INVESTIGATION, 2011, 5 (05): : 900 - 904
  • [24] Application of a focused ion beam to prepare electron microscopy samples of surface nanostructures
    R. L. Volkov
    N. I. Borgardt
    V. N. Kukin
    A. S. Prikhod’ko
    A. S. Basaev
    Yu. P. Shaman
    Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques, 2011, 5 : 900 - 904
  • [25] Investigation of the structure of damage layers in TEM samples prepared using a focused ion beam
    Rubanov, S
    Munroe, PR
    JOURNAL OF MATERIALS SCIENCE LETTERS, 2001, 20 (13) : 1181 - 1183
  • [26] Simulation of Material Sputtering and Gallium Implantation during Focused Ion Beam Irradiation of a Silicon Substrate
    O. V. Podorozhniy
    A. V. Rumyantsev
    R. L. Volkov
    N. I. Borgardt
    Semiconductors, 2023, 57 : 58 - 64
  • [27] Simulation of Material Sputtering and Gallium Implantation during Focused Ion Beam Irradiation of a Silicon Substrate
    Podorozhniy, O. V.
    Rumyantsev, A. V.
    Volkov, R. L.
    Borgardt, N. I.
    SEMICONDUCTORS, 2023, 57 (01) : 58 - 64
  • [28] Broad ion beam milling of focused ion beam prepared transmission electron microscopy cross sections dor high resolution electron microscopy
    Langford, RM
    Petford-Long, AK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (03): : 982 - 985
  • [29] High resolution XRD studies of ion beam irradiated InGaAs/InP multi quantum wells
    Dhamodaran, S.
    Sathish, N.
    Pathak, Anand P.
    Turos, Andrzej
    Avasthi, Devesh K.
    Arora, Brij M.
    ION-BEAM-BASED NANOFABRICATION, 2007, 1020 : 213 - 220
  • [30] CONVERGENT BEAM ELECTRON-DIFFRACTION FROM INP INGAAS SINGLE QUANTUM-WELLS
    JORDAN, IK
    CHERNS, D
    HOCKLY, M
    SPURDENS, PC
    MICROSCOPY OF SEMICONDUCTING MATERIALS 1989, 1989, 100 : 293 - 298