Cd3As2 provides an excellent platform for studying the physics of three-dimensional Dirac semimetals due to its stability as well as its compatibility with thin film growth. Crystals made using both bulk and thin film synthesis are unintentionally doped n-type, and other than introducing Zn to reduce the carrier concentration, no efforts have been reported to alter this intrinsic doping without major changes to the band structure. Here, group VI elements Te and Se are introduced during epitaxy to increase the electron concentration of the films. Starting from an unintentionally doped electron concentration of 1-2 x 10(17) cm(-3), concentrations of up to 3 x 10(18) cm(-3) are achieved. Analysis of Shubnikov-de Haas oscillations reveals good agreement in calculated effective mass and Fermi velocity of highly doped films with unintentionally doped single crystals with similar electron concentrations. The density functional theory is also performed to study the effects of group VI substitutions and confirms no strong perturbations in the electronic structure. This work ultimately demonstrates tunability in the carrier concentration using extrinsic dopants without substantial changes in the band structure, allowing for intentional design of Fermi-level position for device applications.
机构:
Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R ChinaFudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Cheng, Peihong
Zhang, Cheng
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Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
Collaborat Innovat Ctr Adv Microstruct, Nanjing 210093, Jiangsu, Peoples R ChinaFudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Zhang, Cheng
Liu, Yanwen
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Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
Collaborat Innovat Ctr Adv Microstruct, Nanjing 210093, Jiangsu, Peoples R ChinaFudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Liu, Yanwen
Yuan, Xiang
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Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
Collaborat Innovat Ctr Adv Microstruct, Nanjing 210093, Jiangsu, Peoples R ChinaFudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Yuan, Xiang
Song, Fengqi
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Collaborat Innovat Ctr Adv Microstruct, Nanjing 210093, Jiangsu, Peoples R China
Nanjing Univ, Collaborat Innovat Ctr Adv Microstruct, Natl Lab Solid State Microstruct, Nanjing 210093, Jiangsu, Peoples R China
Nanjing Univ, Dept Phys, Nanjing 210093, Jiangsu, Peoples R ChinaFudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Song, Fengqi
Sun, Qingqing
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Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R ChinaFudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Sun, Qingqing
Zhou, Peng
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Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R ChinaFudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Zhou, Peng
Zhang, David Wei
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Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R ChinaFudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Zhang, David Wei
Xiu, Faxian
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Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
Collaborat Innovat Ctr Adv Microstruct, Nanjing 210093, Jiangsu, Peoples R ChinaFudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China