Molybdenum sputtering film characterization for high gradient accelerating structures

被引：0

作者：

S.Bini ^{[1
]}

B.Spataro ^{[1
]}

A.Marcelli ^{[1
,2
,3
]}

S.Sarti ^{[4
]}

V.A.Dolgashev ^{[5
]}

S.Tantawi ^{[5
]}

A.D.Yeremian ^{[5
]}

Y.Higashi ^{[6
]}

M.G.Grimaldi ^{[7
]}

L.Romano ^{[7
]}

F.Rufno ^{[7
]}

R.Parodi ^{[8
]}

G.Cibin ^{[9
]}

C.Marrelli ^{[10
]}

M.Migliorati ^{[10
]}

C.Caliendo ^{[11
]}

机构：

[1] INFN - LNF,Via E. Fermi 40,Frascati (RM) 00044, Italy

[2] NSRL, University of Science and Technology of China

[3] Chinese Academy of Sciences

[4] University of Rome-Sapienza,Dipartimento di Fisica,Piazzale Aldo Moro 5,Rome 00185,Italy

[5] SLAC National Accelerator Laboratory,2575 Sand Hill Road,Menlo Park,CA 94025,USA

[6] KEK 1-1 Oho,Tsukuba,Ibaraki 305,Japan

[7] University of Catania,Dipartimento di Fisica e Astronomia & MATIS-IMM-CNR,Via S. Sofia 64,Catania 95123,Italy

[8] INFN-Genova,Via Dodecaneso 33,Genova 16146,Italy

来源：

Chinese Physics C | 2013年 / 09期

关键词：

D O I：

暂无

中图分类号：

O572.211 [];

学科分类号：

070202 ;

摘要：

Technological advancements are strongly required to fulfill the demands of new accelerator devices with the highest accelerating gradients and operation reliability for the future colliders.To this purpose an extensive R&D regarding molybdenum coatings on copper is in progress.In this contribution we describe chemical composition,deposition quality and resistivity properties of diferent molybdenum coatings obtained via sputtering.The deposited films are thick metallic disorder layers with diferent resistivity values above and below the molibdenum dioxide reference value.Chemical and electrical properties of these sputtered coatings have been characterized by Rutherford backscattering,XANES and photoemission spectroscopy.We will also consider multiple cells standing wave section coated by a molybdenum layer designed to improve the performance of X-Band accelerating systems.

引用

页码：1 / 7

页数：7

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