Monolithic integration of an AlGaN/GaN metal-insulator field-effect transistor with an ultra-low voltage-drop diode for self-protection

被引:0
|
作者
汪志刚 [1 ]
陈万军 [1 ]
张竞 [1 ]
张波 [1 ]
李肇基 [1 ]
机构
[1] State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China
基金
中央高校基本科研业务费专项资金资助; 中国国家自然科学基金;
关键词
AlGaN/GaN; AlGaN/GaN heterostructures; metal-insulator field-effect transistor; fieldcontrolled diode;
D O I
暂无
中图分类号
TN386 [场效应器件];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
In this paper,we present a monolithic integration of a self-protected AlGaN/GaN metal-insulator field-effect transistor(MISFET).An integrated field-controlled diode on the drain side of the AlGaN/GaN MISFET features a selfprotected function for a reverse bias.This diode takes advantage of the recessed-barrier enhancement-mode technique to realize an ultra-low voltage drop and a low turn-ON voltage.In the smart monolithic integration,this integrated diode can block a reverse bias(> 70 V/μm) and suppress the leakage current(< 5 × 10-11 A/mm).Compared with conventional monolithic integration,the numerical results show that the MISFET integrated with a field-controlled diode leads to a good performance for smart power integration.And the power loss is lower than 50% in conduction without forward current degeneration.
引用
收藏
页码:463 / 468
页数:6
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