Effect of annealing temperature on multiferroic properties of Bi0.85Nd0.15FeO3 thin films prepared by sol-gel method

被引:0
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作者
GOTO Takashi [1 ]
机构
[1] Institute for Materials Research,Tohoku University,Sendai 980-8577,Japan
关键词
Bi0.85Nd0.15FeO3 thin films; sol-gel method; annealing temperature; ferroelectric properties; ferromagnetic properties;
D O I
暂无
中图分类号
TG156.2 [退火];
学科分类号
摘要
Bi0.85Nd0.15FeO3 films were prepared on Pt/Ti/SiO2/Si substrate by a sol-gel method,and annealed at different temperatures.The effect of annealing temperature on the crystal structure,dielectric,ferroelectric,and ferromagnetic properties was investigated.When the Bi0.85Nd0.15FeO3 films were annealed at 490-600°C,the single phase was obtained.Bi0.85Nd0.15FeO3 film annealed at 600°C showed good multiferroic properties with εr of 145 (at 1 MHz),Ms of 44.8 emu/cm3,and 2Pr of 16.6 μC/cm2.
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页码:1572 / 1575
页数:4
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