Experimental studies of superhard materials carbon nitride CNx prepared by ion-beam synthesis method

被引:0
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作者
辛火平
林成鲁
许华平
邹世昌
石晓红
吴兴龙
朱宏
P.L.FHemment
机构
[1] National Laboratory of Functional Materials for Informatics
[2] Shanghai 200083
[3] Shanghai Institute of Metallurgy. Chinese Academy of Sciences
[4] Ion Beam Laboratory
[5] National Laboratory of Solid State Microstructure
[6] National Laboratory for Infrared Physics
[7] Nanjing University
[8] Surrey GU2 5XH. UK
[9] Shanghai Institute of Technical Physics
[10] China
[11] Shanghai 200050
[12] Department of Electronic and Electrical Engineering
[13] Nanjing 210093
[14] University of Surrey. Guildford
[15] Shanghai Institute of Metallurgy
[16] Chinese Academy of Sciences
关键词
ion implantation; C≡N covalent bond; buried carbon nitride CNx;
D O I
暂无
中图分类号
TB39 [其他材料];
学科分类号
0805 ; 080502 ;
摘要
Formation of superhard materials carbon nitride CNt by using ion-beam synthesis method is reported.100-keV high-dose N+ ions were implanted into carbon thin films at different temperatures.The samples were evaluated by X-ray photoelectron spectroscopy (XPS),Fourier transformation-infrared absorption spectroscopy (FTIR),Raman spectroscopy,cross-sectional transmission electron microscopy (XTEM),Rutherford backscattering spectroscopy (RBS).X-ray diffraction analysis (XRD) and Vickers microhardness measurement.The results show that the buried carbon nitride CN> layer has been successfully formed by using 100-keV high-dose N+ ions implantation into carbon thin film.Implantation of reactive ions into silicon (IRIS) computer program has been used to simulate the formation of the buried β-C3N4 layer as N+ ions are implanted into carbon.A good agreement between experimental measurements and IRIS simulation is found.
引用
收藏
页码:404 / 411
页数:8
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