Modeling of Pulsed Direct-Current Glow Discharge

被引：0
|
作者：
杜木 [1 ]
郑亚茹 [1 ]
范宇佳 [1 ]
张楠 [1 ]
刘成森 [1 ]
王德真 [2 ]
机构：
[1] College of Physics and Electronic Technology, Liaoning Normal University
[2] State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology
来源：
Plasma Science and Technology | 2010年 / 04期
关键词：
pulsed direct-current glow discharge; plasma processing; plasma simulation;
D O I：
暂无
中图分类号：
O461.21 [];
学科分类号：
0809 ; 080901 ;
摘要：
A self-consistent model was adopted to study the time evolution of low-voltagepulsed DC glow discharge. The distributions of electric field, ion density and electron density innitrogen were investigated in our simulation, and the temporal shape of the discharge current wasalso obtained. Our results show that the dynamic behaviors of the discharge depends strongly onthe applied pulse voltage, and the use of higher pulse voltages results in a significantly increaseof discharge current and a decrease of discharge delay time. The current-voltage characteristiccalculated by adjusting secondary electron emission coefficient for different applied pulse voltageunder the gas pressure of 1 Torr is found in a reasonable agreement with the experimental results.
引用
收藏
页码：447 / 451
页数：5
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