Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm

被引：0
|
作者：
戴罡 [1 ]
陈彦北 [1 ]
陆建 [1 ]
沈中华 [1 ]
倪晓武 [1 ]
机构：
[1] School of Science, Nanjing University of Science and Technology
来源：
Chinese Optics Letters | 2009年 / 7卷 / 07期
关键词：
SiO; Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm; high;
D O I：
暂无
中图分类号：
TN249 [激光的应用];
学科分类号：
0803 ; 080401 ; 080901 ;
摘要：
A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/SiO2 high reflective (HR) film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation.
引用
收藏
页码：601 / 604
页数：4
相关论文
共 50 条
  • [31] Using monodisperse SiO2 microspheres to study laser-induced damage of nodules in HfO2/SiO2 high reflectors
    Cheng, Xinbin
    Ding, Tao
    He, Wenyan
    Zhang, Jinlong
    Jiao, Hongfei
    Ma, Bin
    Shen, Zhengxiang
    Wang, Zhanshan
    ADVANCES IN OPTICAL THIN FILMS IV, 2011, 8168
  • [32] Effect of λ/2 SiO2 overcoat on the laser damage of HfO2/SiO2 high-reflector coatings
    胡建平
    马平
    许乔
    李伟
    Chinese Optics Letters, 2003, (06) : 340 - 342
  • [33] Effect of vacuum annealing on properties of HfO2/SiO2 reflective films
    Kou, Yang
    Zhang, Mengdie
    Yuan, Lei
    Yang, Feng
    Huang, Kang
    Bo, Yong
    Peng, Qinjun
    INFRARED PHYSICS & TECHNOLOGY, 2024, 136
  • [34] SiO2/HfO2 Laser Film with Enhanced Protection and Antireflection for Sapphire Infrared Windows at High Temperatures
    Zhao, Da-Qiang
    Xu, Fan
    Wang, Gui-Gen
    Zhang, Si-Ying
    Qin, Guo-Shuang
    Wang, Bao-Lin
    Han, Jie-Cai
    ACS APPLIED ELECTRONIC MATERIALS, 2021, 3 (10) : 4611 - 4617
  • [35] Optical description of HfO2/Al/HfO2 multilayer thin film devices
    Ramzan, M.
    Rana, A. M.
    Ahmed, E.
    Bhatti, A. S.
    Hafeez, M.
    Ali, A.
    Nadeem, M. Y.
    CURRENT APPLIED PHYSICS, 2014, 14 (12) : 1854 - 1860
  • [36] Theoretical and experimental investigation of thermal stability of HfO2/Si and HfO2/SiO2 interfaces
    Liu, CL
    Stoker, M
    Hegde, RI
    Rai, RS
    Tobin, PJ
    MODELING AND NUMERICAL SIMULATION OF MATERIALS BEHAVIOR AND EVOLUTION, 2002, 731 : 281 - 284
  • [37] Effectiveness of ion cleaning to improve the laser damage threshold of HfO2/SiO2 optical coatings for high reflection and antireflection at 527 nm and 1054 nm
    Field, Ella S.
    Bellum, John C.
    Kletecka, Damon E.
    PACIFIC RIM LASER DAMAGE 2016 - OPTICAL MATERIALS FOR HIGH-POWER LASERS, 2016, 9983
  • [38] Theoretical simulation analysis of long-pulse laser induced damage in a BK7:SiO2/HfO2 optical anti-reflective films
    Wang, Yaode
    Ma, Yao
    Wang, Di
    Su, Chang
    Zhang, Xihe
    Li, Changli
    OPTIK, 2018, 156 : 530 - 535
  • [39] Optical characterizations and thermal analyses of HfO2/SiO2 multilayered diffraction gratings for high-power continuous wave laser
    Kim, Inki
    So, Sunae
    Mun, Jungho
    Lee, Kwang Hyun
    Lee, Jung Hwan
    Lee, Taejun
    Rho, Junsuk
    JOURNAL OF PHYSICS-PHOTONICS, 2020, 2 (02):
  • [40] 1064 nm laser-induced defects in pure SiO2 fibers
    Stone, J. M.
    Wadsworth, W. J.
    Knight, J. C.
    OPTICS LETTERS, 2013, 38 (15) : 2717 - 2719
12345