Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm

被引：0
|
作者：
戴罡 [1 ]
陈彦北 [1 ]
陆建 [1 ]
沈中华 [1 ]
倪晓武 [1 ]
机构：
[1] School of Science, Nanjing University of Science and Technology
来源：
Chinese Optics Letters | 2009年 / 7卷 / 07期
关键词：
SiO; Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm; high;
D O I：
暂无
中图分类号：
TN249 [激光的应用];
学科分类号：
0803 ; 080401 ; 080901 ;
摘要：
A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/SiO2 high reflective (HR) film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation.
引用
收藏
页码：601 / 604
页数：4
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