Inhibition behavior for copper corrosion by photoelectrochemical methods

被引：0
|
作者：
徐群杰
周国定
机构：
[1] China
[2] Electrochemical Research Group Shanghai University of Electric Power
[3] Shanghai 200090
来源：
Transactions of Nonferrous Metals Society of China | 2003年 / 05期
关键词：
copper; corrosion; inhibitors; inhibition mechanism; photoelectrochemical method;
D O I：
暂无
中图分类号：
TG174.42 [金属防腐剂、缓蚀剂];
学科分类号：
080503 ;
摘要：
The application of photoelectrochemical methods in the inhibition effects for copper corrosion was described. The methods include cyclic voltammetry photocurrent measurements, intensity modulated photocurrent spectrum(IMPS) and laser scanning photoelectrochemical microscopic method(PEM) which have been applied to the evaluation of inhibitors and inhibition behavior. The inhibition effect of BTA for copper corrosion is better than that of 4CBTA, 5CBTA, CBT 1, PTD, BT 250, CBTME and CBTBE at the same concentration. The inhibition mechanism of the derivatives of BTA with —COOH group(4CBTA, 5CBTA, CBT 1) is different from those with estergroup(CBTME, CBTBE).
引用
收藏
页码：1226 / 1230
页数：5
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