Organic light-emitting devices;
Hole transport layer;
Recombination efficiency;
Recombination width;
D O I:
暂无
中图分类号:
TN312.8 [];
学科分类号:
0803 ;
摘要:
A bilayer model with ohmic anode contact and injection limited cathode contact has been proposed to calculate the recombination efficiency and recombination zone width of the device. The effects of the thickness of hole transport layer and the barriers of organic/organic interface on the combination efficiency and recombination width have been discussed. It is found that: (1) When the electrons are blocked fully and the holes are not blocked significantly at the organic/organic interface, for a given L_h/L, the recombination efficiency increases with increasing the applied voltage, but at a higher applied voltage, the recombination efficiency decreases with increasing L_h/L; (2) The recombination efficiency increases with increasing applied voltage and H~′_h, and when applied voltage and H~′_h exceed some value, the recombination efficiency appears as a plateau; (3) The recombination width decreases with increasing the applied voltage and L_h/L. This model might explain the relative experiment phenomena.
机构:City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
Tong, Qing-Xiao
Lai, Shiu-Lun
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机构:City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
Lai, Shiu-Lun
Chan, Mei-Yee
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机构:City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
Chan, Mei-Yee
Tang, Jian-Xin
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机构:City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
Tang, Jian-Xin
Kwong, Hoi-Lun
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机构:
City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R ChinaCity Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
Kwong, Hoi-Lun
Lee, Chun-Sing
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机构:City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
Lee, Chun-Sing
Lee, Shuit-Tong
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机构:City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
机构:
NHK Japan Broadcasting Corp, Sci & Tech Res Labs, Setagaya Ku, Tokyo 1578510, JapanNHK Japan Broadcasting Corp, Sci & Tech Res Labs, Setagaya Ku, Tokyo 1578510, Japan
Tanaka, I
Tokito, S
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机构:
NHK Japan Broadcasting Corp, Sci & Tech Res Labs, Setagaya Ku, Tokyo 1578510, JapanNHK Japan Broadcasting Corp, Sci & Tech Res Labs, Setagaya Ku, Tokyo 1578510, Japan
Tokito, S
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS,
2004,
43
(11A):
: 7733
-
7736