Step instability of the In0.2Ga0.8As (001) surface during annealing

被引:6
|
作者
张毕禅 [1 ]
周勋 [1 ]
罗子江 [1 ]
郭祥 [1 ]
丁召 [1 ]
机构
[1] Low-Dimensional Semiconductor Structure Laboratory, College of Science, Guizhou University, Guiyang 550025, China
基金
中国国家自然科学基金;
关键词
InGaAs; step instability; surface diffusion; kinetic model;
D O I
暂无
中图分类号
O485 [表面物理学];
学科分类号
070205 ; 0805 ; 080502 ; 0809 ;
摘要
Anisotropic evolution of the step edges on the compressive-strained In0.2Ga0.8 As/GaAs(001) surface has been investigated by scanning tunneling microscopy (STM). The experiments suggest that step edges are indeed sinuous and protrude somewhere a little way along the [110] direction, which is different from the classical waviness predicted by the theoretical model. We consider that the monatomic step edges undergo a morphological instability induced by the anisotropic diffusion of adatoms on the terrace during annealing, and we improve a kinetic model of step edge based on the classical Burton–Cabrera–Frank (BCF) model in order to determine the normal velocity of step enlargement. The results show that the normal velocity is proportional to the arc length of the peninsula, which is consistent with the first result of our kinetic model. Additionally, a significant phenomenon is an excess elongation along the [110] direction at the top of the peninsula with a higher aspect ratio, which is attributed to the restriction of diffusion lengths.
引用
收藏
页码:573 / 579
页数:7
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