Quantum Chemical Study of the Leveling Property of Organic Additives for Ni Electroplating

被引：0
|
作者：
Luo Ming-dao
Department of Chmistry
机构：
来源：
Wuhan University Journal of Natural Sciences | 2003年 / 02期
基金：
中国国家自然科学基金;
关键词：
Ni plating solution; additives; AM1; method; leveling property; adsorption model;
D O I：
暂无
中图分类号：
TQ153 [电镀工业];
学科分类号：
0817 ;
摘要：
The geometries of the molecules of eight organic additives were optimized and the net charge, EHOMO and ELUMO were obtained using AM1 method, respectively. The result shows that there is the correlation between the leveling property and the frontier orbital energy levels of these additives, and the adsorption models and leveling mechanics were discussed. The rule between the frontier orbital energy levels and the leveling property is verified by the experiments.
引用
收藏
页码：447 / 450
页数：4
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