Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range

被引：2
|
作者：
谭默言 [1 ]
李浩川 [1 ]
黄秋实 [1 ]
周洪军 [2 ]
霍同林 [2 ]
王晓强 [1 ]
朱京涛 [1 ]
机构：
[1] Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Institute of Precision Optical Engineering, Physics Department, Tongji University
[2] National Synchrotron Radiation Laboratory, University of Science and Technology of China
来源：
ChineseOpticsLetters | 2011年 / 9卷 / 02期
基金：
中国国家自然科学基金;
关键词：
Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range; nm; Si;
D O I：
暂无
中图分类号：
TB34 [功能材料];
学科分类号：
080501 ;
摘要：
Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5° is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.
引用
收藏
页码：83 / 86
页数：4
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