Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range

被引：2

作者：

谭默言 ^{[1
]}

李浩川 ^{[1
]}

黄秋实 ^{[1
]}

周洪军 ^{[2
]}

霍同林 ^{[2
]}

王晓强 ^{[1
]}

朱京涛 ^{[1
]}

机构：

[1] Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Institute of Precision Optical Engineering, Physics Department, Tongji University

[2] National Synchrotron Radiation Laboratory, University of Science and Technology of China

来源：

ChineseOpticsLetters | 2011年 / 9卷 / 02期

基金：

中国国家自然科学基金;

关键词：

Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range; nm; Si;

D O I：

暂无

中图分类号：

TB34 [功能材料];

学科分类号：

080501 ;

摘要：

Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5° is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.

引用

页码：83 / 86

页数：4

共 20 条

[1] Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range
Tan, Moyan
Li, Haochuan
Huang, Qiushi
Zhou, Hongjun
Huo, Tonglin
Wang, Xiaoqiang
Zhu, Jingtao
CHINESE OPTICS LETTERS, 2011, 9 (02)
[2] Broadband Mo/Si multilayer analyzers for the 15-17 nm wavelength range
Wang, Hongchang
Zhu, Jingtao
Wang, Zhanshan
Zhang, Zhong
Zhang, Shumin
Wu, Wenjuan
Chen, Lingyan
Michette, Alan G.
Powell, A. Keith
Pfauntsch, Slawka J.
Schaefers, Franz
Gaupp, Andreas
THIN SOLID FILMS, 2006, 515 (04) : 2523 - 2526
[3] Molybdenum-silicon aperiodic multilayer broadband polarizer for 13-30 nm wavelength range
Tan, M. Y.
Zhu, J. T.
Chen, L. Y.
Wang, Z. S.
Le Guen, K.
Jonnard, P.
Giglia, A.
Mahne, N.
Nannarone, S.
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2011, 654 (01): : 588 - 591
[4] Highly reflective Mo/Be/Si multilayer mirrors with zero stress values for 13.5 nm wavelength
Smertin, R. M.
Chkhalo, N. I.
Polkovnikov, V. N.
Salashchenko, N. N.
Shaposhnikov, R. A.
Zuev, S. Yu.
THIN SOLID FILMS, 2023, 782
[5] Broadband aperiodic Mo/Si multilayer polarization elements for EUV region
Zhu, Jing-Tao
Wang, Zhan-Shan
Wang, Hong-Chang
Zhang, Zhong
Wang, Feng-Li
Qin, Shu-Ji
Chen, Ling-Yan
Cui, Ming-Qi
Zhao, Yi-Dong
Sun, Li-Juan
Zhou, Hong-Jun
Huo, Tong-Lin
Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2007, 15 (12): : 1886 - 1893
[6] Stress-Free Highly Reflective Multilayer Mo/Be/Si Mirrors for Operation in the Vicinity of the Wavelength 13.5 nm
R. M. Smertin
S. Yu. Zuev
V. N. Polkovnikov
N. I. Chkhalo
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques, 2023, 17 : S239 - S243
[7] Stress-Free Highly Reflective Multilayer Mo/Be/Si Mirrors for Operation in the Vicinity of the Wavelength 13.5 nm
Smertin, R. M.
Zuev, S. Yu.
Polkovnikov, V. N.
Chkhalo, N. I.
JOURNAL OF SURFACE INVESTIGATION, 2023, 17 (SUPPL 1): : S239 - S243
[8] Reflective phase shift measurement of the Mo/Si multilayer mirror in extreme ultraviolet region
Wang, Fengli
Liu, Lei
Duan, Wei
Jiang, Li
Li, Wenbin
Wang, Zhanshan
Zhu, Jingtao
Zhan, Zhong
Chen, Lingyan
Zhou, Hongjun
Huo, Tonglin
OPTIK, 2013, 124 (21): : 5003 - 5006
[9] Demonstration of the high collection efficiency of a broadband Mo/Si multilayer mirror with a graded multilayer coating on an ellipsoidal substrate
Ichimaru, S.
Takenaka, H.
Namikawa, K.
Gullikson, E. M.
Maruyama, M.
Oku, S.
REVIEW OF SCIENTIFIC INSTRUMENTS, 2015, 86 (09):
[10] B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm
王占山
张淑敏
吴文娟
朱京涛
王洪昌
李存霞
徐垚
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张众
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Chinese Optics Letters, 2006, (10) : 611 - 613

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