Microstructure and electrical properties of La2 O3-doped ZnO-based varistor thin films by sol-gel process

被引:0
|
作者
徐东 [1 ,2 ]
姜斌 [1 ]
崔凤单 [1 ]
杨永涛 [1 ]
徐红星 [1 ]
宋琪 [1 ]
于仁红 [1 ,3 ]
机构
[1] School of Material Science and Engineering,Jiangsu University
[2] State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China
[3] Changzhou Ming Errui Ceramics Co.,Ltd.
基金
高等学校博士学科点专项科研基金;
关键词
zinc oxide; varistor; film; sol-gel process; electrical properties; microstructure;
D O I
暂无
中图分类号
O484.42 [];
学科分类号
080501 ; 1406 ;
摘要
Microstructure and electrical properties of La2 O3-doped ZnO-Bi2 O3 thin films prepared by sol–gel process have been investigated.X-ray diffraction shows that most diffraction peaks of ZnO are equal,and the crystals of ZnO grow well.Scanning electron microscopy and atomic force microscopy results indicate that the samples have a good structure and lower surface roughness.The nonlinear V–I characteristics of the films show that La2 O3 develops the electrical properties largely and the best doped content is 0.3% lanthanum ion,with the leakage current of 0.25 mA,the threshold field of 150 V/mm and the nonlinear coefficient of 4.0 in detail.
引用
收藏
页码:9 / 13
页数:5
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