EELS study on BST thin film under electron beam irradiation

被引：0
|
作者：
RAO Jie & ZHU Jing Electron Microscopy Laboratory
机构：
来源：
Science in China(Series E:Technological Sciences) | 2004年 / 06期
关键词：
BST thin film; irradiation damage; EELS;
D O I：
暂无
中图分类号：
O441 [电磁学];
学科分类号：
0809 ;
摘要：
It was found that BST thin film was damaged by the irradiation of high density electron beam (the current density was about 2 nA/cm2). In-situ and real time EELS showed that the intensity ration of Ti to O edge and the distance between Ti and O edge changed. It indicated that the film lost oxygen and thus the oxidation states of positive ions lowered. EELS study with high spatial resolution proved that compared with the inner of columnar grains, the grain boundaries with special structure and chemical environment were the main passageway of oxygen loss.
引用
收藏
页码：659 / 666
页数：8
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