OBSERVATION ON SPUTTERING SURFACE OF ALLOYS IN GLOW DISCHARGE

被引:0
|
作者
REN Jianshi ZHAO Huilin ZHANG Gongshu Institute of Metal Research
机构
关键词
glow discharge; cathodic sputtering; nickel base alloy;
D O I
暂无
中图分类号
学科分类号
摘要
Glow discharge cathodic sputtering of alloys containing second phase precipitates or injectedoxide particles has been observed with energy dispersive X-ray spectrometer and scanningelectron microprobe.It was shown that the formation of cones during the sputtering in thesealloys is due to masking of the matrix by glow sputtering second phase precipitates or oxideparticles.At steady state,the density of cottes were found to be a function of the densities pre-cipitates or oxide particles in bulk alloy.In addition to the changes of local sputtering rate,theelectrostatic effect may play a role on the formation fo cones.
引用
下载
收藏
页码:65 / 69
页数:5
相关论文
共 50 条
  • [1] Sputtering Rates of Alloys in Glow Discharge
    Jianshi REN and Gongshu ZHANG (Institute of Metal Research
    Journal of Materials Science & Technology, 1995, (04) : 295 - 298
  • [2] Sputtering rates of alloys in glow discharge
    Ren, Jianshi
    Zhang, Gongshu
    Wang, Zhenshu
    Zhao, Jinwei
    Journal of Materials Science and Technology, 1995, 11 (04): : 295 - 298
  • [3] Glow discharge and sputtering characteristics of copper alloys
    Habib, SK
    Mousa, IA
    Rizk, A
    VACUUM, 1996, 47 (09) : 1043 - 1046
  • [4] SPUTTERING RATES OF ALLOYS IN GLOW-DISCHARGE
    REN, JS
    ZHANG, GS
    WANG, ZS
    ZHAO, JW
    JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 1995, 11 (04) : 295 - 298
  • [5] GLOW-DISCHARGE SPUTTERING AND EXCITATION CHARACTERISTICS OF BRASS ALLOYS
    FANG, DC
    MARCUS, RK
    JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 1988, 3 (06) : 873 - 878
  • [6] CATHODE SPUTTERING OF NIOBIUM AND ITS ALLOYS IN A HELIUM GLOW-DISCHARGE
    SKOROV, DM
    KALIN, BA
    VOLKOV, VB
    KARTSEV, PI
    KIRILIN, NM
    SOVIET ATOMIC ENERGY, 1975, 38 (05): : 431 - 432
  • [7] GLOW-DISCHARGE SPUTTERING OF ALLOYS OBSERVED BY ATOMIC-ABSORPTION SPECTROSCOPY
    TEO, WB
    HIROKAWA, K
    SURFACE AND INTERFACE ANALYSIS, 1987, 10 (06) : 291 - 300
  • [8] CORRELATION BETWEEN CONSTITUENT AND SPUTTERING RATE OF BINARY ALLOYS IN GLOW DISCHARGE LAMP
    REN Jianshi
    ZHANG Gongshu Institute of Metal Research
    LIU Gen
    LIU Shenglin Shanghai University of Technology
    Acta Metallurgica Sinica(English Letters), 1992, (12) : 462 - 466
  • [9] Target surface condition during reactive glow discharge sputtering of copper
    Depla, D
    Haemers, J
    De Gryse, R
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (01): : 91 - 96
  • [10] DC glow discharge for sputtering & biasing
    Mattox, DM
    PLATING AND SURFACE FINISHING, 2000, 87 (12): : 63 - 65