Electrical contacts to two-dimensional transition-metal dichalcogenides

被引:0
|
作者
Shuxian Wang [1 ]
Zhihao Yu [2 ]
Xinran Wang [2 ]
机构
[1] Kansas Academy of Mathematics and Science, Fort Hays State University
[2] National Laboratory of Solid State Microstructures, School of Electronic Science and Engineering, and Collaborate Innovation Center of Advanced Microstructures, Nanjing University
关键词
two-dimension; channel materials; Fin-FET;
D O I
暂无
中图分类号
TN304 [材料];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
Two-dimensional(2D) transition-metal dichalcogenides(TMDCs) have attracted enormous interests as the novel channel materials for atomically thin transistors. Despite considerable progress in recent years, the transistor performance is largely limited by the excessive contact resistance at the source/drain interface. In this review, a summary of recent progress on improving electrical contact to TMDC transistors is presented. Several important strategies including topology of contacts, choice of metals and interface engineering are discussed.
引用
收藏
页码:66 / 73
页数:8
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